Used ZYGO NewView 5000 #9307807 for sale

ZYGO NewView 5000 is a state-of-the-art, advanced mask and wafer inspection equipment that uses proprietary technology to identify defects and errors in integrated circuit designs at 18nm feature size and below. The system utilizes an optometric measurement platform that incorporates six distinct inspection methods to identify any defects or nonconformities in the layout of mask layers during the device fabrication process. These methods include Laser Interferometry, Charge Coupled Device (CCD) imaging, Spectroscopy, Topography, CD/Width Measurement, and Focus-Variation. ZYGO 5000 boasts a 400mm Chuck size to accommodate large wafers and substrates, as well as a high-resolution 2Kx2K image sensor with 0.08um sub-pixel resolution. This allows for precise target positioning and defect characterization over wide-area measurement fields and the ability to identify even the smallest of flaws in each mask layer. In addition, the unit utilizes advanced photomask defect measurement capabilities which allows for non-destructive imaging of defects on mask layers and the quantification of parameters such as geometrical dimension, aspect ratio, contrast, and defect size. NewView 5000 is an ideal choice for device fabs and mask shops that require advanced, accurate, and reliable mask and wafer inspection solutions. Its cutting-edge features provide users with the flexibility to adjust the optometric platform to match different device node requirements, and make pinpointing and quantifying defects faster and more efficient. The machine also features a user-friendly and intuitive graphical user interface that provides detailed information on detected defects and makes it easy to access metrology data. The ability to store and manage data makes traceability and quality assurance a breeze. 5000 is truly an innovators dream. Its groundbreaking capabilities ensure that users are in the driver's seat when it comes to device fabrication. With unlimited potential and powered by the latest technology, the tool has the potential to revolutionize the way mask and wafers are inspected.