Used TEL / TOKYO ELECTRON Cellesta+ #9182405 for sale

It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.

ID: 9182405
Wafer Size: 12"
Vintage: 2011
Single wafer processing system, 12" Application used: FEOL Chamber 2-1: Process: SC1 Chemical: NH4OH/DIW(1:500)(1000ml/min,60deg) Spin rotation: 1000 rpm with IPA(190ml/min,25deg) Chuck type: Mechanical chuck Chamber 2-2: Chemical: NH4OH/DIW(1:500)(1000ml/min,60deg) Spin rotation: 1000 rpm With IPA(190ml/min,25deg) Chuck type: Mechanical chuck Chamber 2-3: Chemical: NH4OH/DIW(1:500)(1000ml/min,60deg) Spin rotation: 1000 rpm With IPA(190ml/min,25deg) Chuck type: Mechanical chuck Chamber 2-4: Chemical: NH4OH/DIW(1:500)(1000ml/min,60deg) Spin rotation: 1000 rpm With IPA(190ml/min,25deg) Chuck type: Mechanical chuck Chamber 2-5: Chemical: NH4OH/DIW(1:500)(1000ml/min,60deg) Spin rotation: 1000 rpm With IPA(190ml/min,25deg) Chuck type: Mechanical chuck Chamber 2-6: Chemical: NH4OH/DIW(1:500)(1000ml/min,60deg) Spin rotation: 1000 rpm With IPA(190ml/min,25deg) Chuck type: Mechanical chuck Chamber 2-7: Chemical: NH4OH/DIW(1:500)(1000ml/min,60deg) Spin rotation: 1000 rpm With IPA(190ml/min,25deg) Chuck type: Mechanical chuck Chamber 2-8: Chemical: NH4OH/DIW(1:500)(1000ml/min,60deg) Spin rotation: 1000 rpm With IPA(190ml/min,25deg) Chuck type: Mechanical chuck Chamber 2-9: Chemical: NH4OH/DIW(1:500)(1000ml/min,60deg) Spin rotation: 1000 rpm With IPA(190ml/min,25deg) Chuck type: Mechanical chuck Chamber 2-10: Chemical: NH4OH/DIW(1:500)(1000ml/min,60deg) Spin rotation: 1000 rpm With IPA(190ml/min,25deg) Chuck type: Mechanical chuck Chamber 2-11: Chemical: NH4OH/DIW(1:500)(1000ml/min,60deg) Spin rotation: 1000 rpm With IPA(190ml/min,25deg) Chuck type: Mechanical chuck Chamber 2-12: Chemical: NH4OH/DIW(1:500)(1000ml/min,60deg) Spin rotation: 1000 rpm With IPA(190ml/min,25deg) Chuck type: Mechanical chuck Currently stored in cleanroom 2011 vintage.
TEL / TOKYO ELECTRON Cellesta+ is a top-of-the-range wafer and mask scrubber, designed for high-precision semiconductor wafer production. The powerful scrubbing mechanism performs a thorough cleaning without causing any damage or contamination on the surface of wafers, while the advanced cleaning algorithm adapts to different technologies, providing a reliable, consistent cleaning process. TEL Cellesta+ is equipped with a high-performance dust extractor that uses a powerful air flow for an efficient dust removal process. It can handle both silicon-on-insulator (SOI) wafers and bulk wafers with up to a 8" diameter. Inside the wafer housing there is a cleaning platform that consists of an industrial grade scrubber brush and an audio-frequency vibrating nozzle that increases the area of contact between the cleaning surfaces and the wafer surface. This combined technology creates a highly effective cleaning operation with minimal latency and lower operating costs. TOKYO ELECTRON Cellesta+ also has an integrated vision system and independent light source for seamless surface inspection. It can detect surface damage, contamination, microcracks, pits, and other potential production issues, then alert users of any issues that need to be addressed. This real-time feedback helps to ensure wafer quality is maintained throughout the production process. The scrubber is environmentally friendly and is supported by a robust safety system. It is designed to shut off automatically in the event of a power outage, as well as offering low noise operation. In addition, its high-end control unit offers remote commands and error diagnosis, allowing for efficient troubleshooting. Overall, Cellesta+ delivers superior wafer cleaning, surface vision and dust extraction capabilities, making it an ideal solution for advanced wafer production.
There are no reviews yet