Used RIGAKU Ultima IV #293674255 for sale
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RIGAKU Ultima IV is a multipurpose X-Ray diffractometer designed for X-ray diffraction analysis of materials in research, industry, and the educational sector. It consists of an X-ray source, a sample mount, and a detector which is powered by an in-built computer system. Ultima IV offers a range of features such as sample environment control, high throughput, an enhanced imaging software package, and improved methods for data acquisition and analysis. RIGAKU Ultima IV X-ray source is built around a sealed tube and power supply that can produce X-rays with energies ranging from 0.2-2.5 keV. The source utilizes a tungsten anode with a minimum focal spot of 0.1mm and a high power output up to 50kW, allowing a high resolution for small samples. Ultima IV also makes use of several X-ray optics such as a bent center-shielded monochromator and two-dimensional position-sensitive X-ray detectors for imaging capabilities. Samples are mounted in an automated sample holder which can support samples ranging from single crystals to large grains or other polycrystalline materials. This flexibility allows for the study of a wide range of materials. RIGAKU Ultima IV also offers rapid automated indexing and phasing, which significantly reduce the time taken to assess a sample's diffraction pattern. Other features of Ultima IV include a user-friendly interface with a wide range of add-on software packages, automatic sample environment control, and the ability to collect and analyse data in real-time. Its automated approach helps users to quickly arrive at correct and reliable results for difficult materials such as high-pressure crystals, nano materials, and alloys. When used in combination with its imaging software package, RIGAKU Ultima IV provides a powerful combination of diffraction and imaging technology that make it an ideal X-ray system for research, industry and educational applications. It is a highly versatile system suitable for a wide range of experiments and analysis, including phase identification, surface and subsurface reflectivity, texture analysis, boundaries studies and stress analysis.
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