Used RIGAKU Wafer X-300 #9145497 for sale

RIGAKU Wafer X-300 is a state-of-the-art x-ray equipment designed for high-energy applications. The system's primary purpose is to measure the physical properties of materials, such as strain, doping, and texture, at the atomic or near-atomic scale. The unit utilizes a high-energy source and a large area scintillator to produce high-resolution images of samples up to 7 nm in thickness. The source of RIGAKU WAFERX 300 is a 100 keV X-ray generator, which produces a wide range of x-ray wavelengths. This allows for the examination of a range of heterogeneous materials and structures up to 7 nm in thickness. The machine is controlled by a specially designed control panel, which provides precise regulation of the x-ray dose, beam alignment, and exposure time. The scintillator used for Wafer X-300 image detector is a large area (260 x 215 cm) and wavelength-selective scintillator made of a cadmium-zinc-telluride (CZT) material. The scintillator is capable of detecting x-ray photons with energies up to 100 keV. The detector also has a high quantum efficiency, with a detection efficiency of up to 95 % for high energy x-rays. In addition to the source and image detector, WAFERX 300 also includes an automated sample handling platform. This platform allows for the automated loading and unloading of samples from the tool. The platform also has several dedicated sample manipulators, which allow for the external sample manipulation or handling without the need for manual intervention. The asset is designed to be flexible, allowing for customization according to an individual's needs. RIGAKU Wafer X-300 can be configured with a range of detectors, x-ray sources, objective lenses, and phosphors. Furthermore, a customizable software package is included for data acquisition, image processing, analysis, and reporting. Overall, RIGAKU WAFERX 300 is a highly sophisticated x-ray model that is suitable for a variety of high-energy applications. The equipment's design combines a range of advanced features, including a high-energy source, wavelength-selective scintillator, and automated sample loading and manipulation. Wafer X-300 is capable of producing high-resolution images of heterogeneous samples up to 7 nm in thickness, making it an invaluable tool for materials research.