Used TEL / TOKYO ELECTRON MARK Vz #9134876 for sale

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ID: 9134876
Wafer edge exposure (WEE) system 2004 vintage.
TEL / TOKYO ELECTRON MARK Vz is a non-contact exposure equipment for photoresists. It is a fully integrated and automated system, combining exposure, aligning, data logging and wafer handling processes. The unit provides high throughput and is designed to produce intricate and highly detailed microstructures, such as extreme ultraviolet (EUV) photomasks for lithography. TEL MARK-VZ is equipped with a laser-based projection machine. It uses an ultra-high density, high bandwidth, multi-spot laser to achieve high-speed, precise exposure. The projection tool allows the exposure of large wafer diameters with high resolution and uniformity. In addition, it features a unique, highly precise Variable Spot Size Mode that allows the laser beam spot size to be varied during projection so as to optimize the performance. This asset supports a wide variety of photomasks, including opaque, transmissive and diffractive masks, and can produce a broad range of structures, from small to large patterns. The model is also equipped with a wafer stage for positioning and orientation. The wafer stage utilizes a dual-axis, high-precision aligner and rotation equipment for wafer loading, alignment and exposure. The system is capable of scanning the wafer edge and pre-aligning the wafer before the exposure. The precision of the unit and the high-speed rotation ensure precise and accurate exposure. The laser-based, non-contact exposure of TOKYO ELECTRON MARK V-Z maximizes the throughput of the machine, and the integrated wafer handler and scanning tool helps to reduce wafer damage and contamination. Additionally, the asset has a built-in data logging model that tracks the exposure history for each wafer. This data can be used for quality control and quality assurance purposes. TEL MARK Vz is an excellent choice when a reliable, high-precision exposure equipment is needed for photoresists. It is capable of producing intricate, highly detailed microstructures with minimal distortion. Furthermore, it is adjustable, runs efficiently and yields consistent results. TEL MARK V-Z is designed for industrial-grade production of photomasks and meets the needs of the most demanding applications.
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