Photoresist

Spin rinse dryers (SRD).

AIO corporation IPA vapor dryer,6".

Coater / Developer system 2008 vintage.

Photostabilization system 1995 vintage.

Manual coater Spin coating system.

Electron beam lithography system, 6" Includes: Variable shaped system Shot size: 100×100 nm² - 6.3×6.3 µm² Maximal substrate: 7" Square Electron energy: 20 keV Manuals Spare parts Micro components : Microelectronics Reticles Grids Resolution target Micro lens Fresnel lens Diffractive optical elements Computer generated holograms ~1990 vintage.

Curtain coating system Available in different modules: centering, preheating, coating chamber A, curing oven A, coating chamber B, curing oven B, cool down oven, etc. PLC, software, PC and modem were upgraded in 2008 Windows based system Panel size this system can handle: Width: minimum 12" and max 24" Length: minimum 12" and max 24" Thickness : minimum 0.003" and max 0.2" Thru put is 120 panels/hr Space Lx W x H required for installation of this system: Length of the line is: 42 feet Width of the line is: 5 feet Height of the line is: 10 feet The exhaust is part of the system so no extra blowers are required Operating manuals and electrical drawings are available in English System is maintained by specialists Currently installed in factory 1997 vintage.

Systems Stainless steel pass through.

Track system Currently de-installed 2009 vintage.

Automatic washing machine, silicon unglued.

Developer system, 6" 1992 vintage.

Coater systems Missing parts: Chiller Motor.

Photoresist (2) coaters / (2) Developers system, 8" Dual block IFB.

Spin dryer.

Coater systems, 8".

Coater, 8".

Coater, 6" 1997 vintage.

Coaters, 4"-6" (4) Horizontal load ports (2) Coater cups (6) Resist lines with 3 pumps (8) Hot plates (2) Cool plates Temperature controller / Unit IDS300 Pumps Front end 1995 vintage.

Spinner.

Spin on glass (SOG) coaters, 8".