Photoresist

Track system, 8" Left to right orientation 4 cassette stage, 2 spin Main controller: NEC FC-9801BX computer C/S robot type: Ceramic pincette Main robot type: 2 Finger wafer transfer main robot Indexer: 4 cassette carrier station 25 wafer slots cassette Spin: Stream nozzle thinner dispense Stream nozzle top rinse dispense Spin servo motor Digital vacuum sensors and interlocked for spin unit 2010 vintage As-is, where-is.

Hot plate alloy track system.

Spin rinse dryer, up to 6".

Spin rinse dryer, up to 5".

Coat / heat track, gold, parts system.

Lab Cryogenic Liquid Storage Tank.

Track system, 4", 5".

SOG silicon dioxide coating machine Model Number: OLD-TR-6142TRUDFD-TM Missing parts.

Spin Rinse Dryer (SRD).

(1) coater / (2) developer 1994 vintage.

UV Coater Hours Shown As: 479 21" ARC Number Of Lamp Heads: 1 Lamp Power: 200/300 WPI Total Wattage: 6,300, 3 Phase, 60Hz Input Voltage: 220,Total Amperage: 46W 2007 vintage.

Photoresist testing system Photospeed Tool Measures Batch to Batch Photospeed Variations Oriel P/N 83995 near UV system with fast shutter Assures that exposure dosage is in-line with your process window requirements No need to sideline your expensive stepper for photoresist testing Provides accurate, incremented bulk area exposures across a wafer Use it to quantify threshold exposure, spectra variations, find potential resist problems and verify lot to lot consistency.

SRD's.

Spin rinse dryer, up to 5".

rinser/dryers.

Spin rinse dryer, 4".

Wafer cleaning system, 8" Chamber dimensions: Length: 14.875" Width: 10.375" Depth: 10.75" (to bottom of the drain holes), 12.625" (to the top of the deck) No IPA bubbler.

Photoresist coater with 15" diameter bowl with digital control.

Spin rinse dryer.

Box Coater Heater power supply, quartz lamps inside Resistance power supply Inside Dimensions: 27" L x 27" D x 30" H System does not have cryo or roughing pumps.