Photoresist

Spin Coater / Developer DUV Track system, 8" Wafer flow direction: L-type Wafer type: Notch Main power: 3 Phase, 200 V, Full load 20.44kVA, 59A 50/60 Hz, 3 Wires and GND/PE Rating 400A, AIC 65KA, Motor 8A Spinner unit configuration: 2 Coater and B-ARC 2 Coater and 3 Developer Indexer: Left type Wafers: SEMI standard wafers/notch type Type (Standard/SMIF): Standard type (4) Unicassettes Coater: SC1(Unit 3) & SC2 (Unit 4): Number of cups: 1 EBR Function Included Resist lines: 8 line Resist pump: PDS-105G-KPV4 Cup rinse function included Back side rinse included Cup rinse included Baffle disk rinse NA Pot rinse included EBR (Edge bead removal) included Prewet function included SC3(Unit 5) & SC4(Unit 6): Number of cups: 1 EBR Function Included Resist lines: 4 line Resist pump: PDS-105G-KPV4 Cup rinse function included Back side rinse included Cup rinse included Baffle disk rinse NA Pot rinse included EBR (Edge bead removal) included Prewet function included Bake: HP: Total 6 - Unit 8, 9, 11, 12, 17, 18 RHP: Total 8 - Unit 25, 26, 28, 29, 31, 32, 35, 36 CP: Total 7 - Unit 7, 10, 16, 24, 27, 30, 34 AHL: Total 3 - Unit 13, 14, 15 EEW: Total 1 - Unit 33 Developer: SC1(Unit 3) & SC2 (Unit 4): Number of cups: 1 Developer number nozzle: 1 DIW rinse nozzle: 1 Back side rinse line: 1 Flow meters with sensor: DEV, DIW1, DIW2, back-side rinse, ORG, FWD Dev1 included Dev2 NA Prewet included DIW1 included DIW2 NA Back side rinse included TR: TR1 ARM included TR2 ARM included TR3 ARM included Others: Thermo controller model: CET-CU, mass 7kg THC model: SPC-2313-UC-A CP controller model: FRD-A200-UC In-line with stepper type: de-installed HMDS Suppy type: Quart bottle to buffer tank Thinner supply type: Canister tank Developer supply type: Facility supply EEW: Number of units: 1 (Unit 33) Lamp house type: with lamphouse IF-B: Number of units: 1 Software: Main soft version: de-installed On-line system type: SECS-II, GEM Miscellaneous: Signal tower lamp: 3 color (red, orange, green) Sub Module configuration: Source bottle cabinet, SC cabinet, ETU cabinet, Controller cabinet, IFB ACU cabinet, Input power supply box 2003 vintage.

Track system, 8" Left to right orientation 4 cassette stage, 2 spin Main controller: NEC FC-9801BX computer C/S robot type: Ceramic pincette Main robot type: 2 Finger wafer transfer main robot Indexer: 4 cassette carrier station 25 wafer slots cassette Spin: Stream nozzle thinner dispense Stream nozzle top rinse dispense Spin servo motor Digital vacuum sensors and interlocked for spin unit 2010 vintage As-is, where-is.

Coat / heat track, gold, parts system.

Lab Cryogenic Liquid Storage Tank.

Hot plate alloy track system.

Spin rinse dryer, up to 6".

Spin rinse dryer, up to 5".

(1) coater / (2) developer 1994 vintage.

UV Coater Hours Shown As: 479 21" ARC Number Of Lamp Heads: 1 Lamp Power: 200/300 WPI Total Wattage: 6,300, 3 Phase, 60Hz Input Voltage: 220,Total Amperage: 46W 2007 vintage.

Photoresist testing system Photospeed Tool Measures Batch to Batch Photospeed Variations Oriel P/N 83995 near UV system with fast shutter Assures that exposure dosage is in-line with your process window requirements No need to sideline your expensive stepper for photoresist testing Provides accurate, incremented bulk area exposures across a wafer Use it to quantify threshold exposure, spectra variations, find potential resist problems and verify lot to lot consistency.

SOG silicon dioxide coating machine Model Number: OLD-TR-6142TRUDFD-TM Missing parts.

Spin Rinse Dryer (SRD).

Track system, 4", 5".

Photoresist coater with 15" diameter bowl with digital control.

Wafer cleaning system, 8" Chamber dimensions: Length: 14.875" Width: 10.375" Depth: 10.75" (to bottom of the drain holes), 12.625" (to the top of the deck) IPA Bubbler: No Utilizes a sealed quick connect bottle on the front of the tool Currently warehoused.

Spin rinse dryer, up to 5".

rinser/dryers.

Spin rinse dryer, 4".

SRD's.

Box Coater Heater power supply, quartz lamps inside Resistance power supply Inside Dimensions: 27" L x 27" D x 30" H System does not have cryo or roughing pumps.