Used PURE AIRE (Photoresist) for sale

Photoresist equipment offered by 'PURE AIRE' manufacturer are cutting-edge solutions for the semiconductor and microelectronics industries. They provide a wide range of analogues designed to meet various application requirements and offer exceptional performance. The advantages of the 'PURE AIRE' photoresist systems lie in their high resolution capabilities, excellent adhesion properties, and exceptional chemical resistance. These units enable precise patterning and allow for the fabrication of intricate microstructures. They are well-suited for advanced lithographic processes, such as deep UV and electron beam lithography. One example of the photoresist system from 'PURE AIRE' is UF72AE. It is a positive photoresist with excellent resolution capabilities, providing sub-micron feature sizes. UF72AE exhibits high sensitivity, allowing for fast processing times. This system offers improved adhesion to various substrates, making it suitable for a wide range of applications, including IC fabrication and MEMS manufacturing. Another example is the 'PURE AIRE' negative photoresist system, which provides high contrast and resolution. It is ideal for applications that require the fabrication of high aspect ratio structures, such as microfluidic devices and optical elements. Overall, 'PURE AIRE' photoresist machines are known for their advanced performance, making them the preferred choice for demanding microelectronics applications.