Used AMAT / APPLIED MATERIALS 0020-0323 Rev H #9145237 for sale

AMAT / APPLIED MATERIALS 0020-0323 Rev H is an advanced thermal reactor intended for use in chemical vapor deposition (CVD) processes. The reactor is designed to offer a high degree of control, precision, and reproducibility, making it ideal for those seeking to develop or enhance production speed, consistency, and reliability. The reactor features an advanced closed-loop process control system to ensure accurate thermal control and a uniform processing environment. It also includes a range of diagnostic and data-logging tools to document system performance and allow for long-term process optimization. The reactor has a 24-inch by 24-inch wafer capacity, allowing it to accommodate up to 2504 wafers. The pressure is adjustable over a range of 1 to 150 Torr, which supports a variety of applications including epitaxial deposition and low-temperature processes. The temperature range is also adjustable, offering between ambient and 1000°C. It also features a state-of-the-art microprocessor-controlled station that can precisely store up to 100 different process recipes. AMAT 0020-0323 Rev H also offers several user-friendly features, such as safety interlocks, real-time monitoring, and consistent performance. The interlocks help ensure safety, while the real-time monitoring allows operators to check process parameters and adjust them if needed. Finally, the consistent performance ensures repeatable results, which can be further optimized through the utilization of process recipes. In conclusion, APPLIED MATERIALS 0020-0323 Rev H is an advanced thermal reactor designed for use in CVD processes. It offers an impressive degree of control, precision, and reproducibility, allowing for the development and optimization of desired process outcomes. With its capacity to handle up to 2504 wafers, adjustable pressure and temperature ranges, and safety interlocks, the reactor provides a reliable and accurate solution for those looking for improved performance, consistency, and reliability.