Reactors

PECVD system Process: SiO4, SiN 1995 vintage.

PECVD system Process: SiO, SiN 1995 vintage.

PECVD Systems SiOx, SiNx, SiOxNy Deposition Batch process Platen: 450mm With 300°C+ heater RF Power: 350W 13.56MHz and 300W 480KHz Gas pod with 6 lines including following MFCs: N2: 1000sccm N2O: 100sccm N2O: 2000sccm NH3: 100sccm SiH4: 2000sccm Windows PC Currently crated Not included: Pump Chiller 2006-2007 vintage.

CVD System, 8" Process: DxL (5) Chambers.

CVD System, 8" (4) Chambers: (2) TEOS, (2) Sputter 1997 vintage.

CVD System Standard and PNL chamber Shrink chambers Frame has PNL option Module controller: MC1 P166 QNX4 IOC Version: 4.1 Shuttle type SMC L-motion slit valve Verify end point detector RFG 3000 Generator Power rack: MSSD.

MOCVD System, 8", 1995 vintage.

Deposition system, 6" Process capability: 30pph Chamber 1: Oxide: LH DryVAC 100S, RUVAC 250, ENI 12B-1250W Chamber 2: Oxide: LH DryVAC 100S, RU VAC 250, ENI 12B-1250W Chamber 3: Oxide: LH DryVAC 100S, RUVAC 250 Controller type: PC S/W Rev.: ROSS 4.8 Process Gases: TEOS/O2?C3F8 External cooling: Water cooled.

Epitaxial reactors.

SACVD BPSG System, 8", 2000 vintage.

System Includes turbo pump Currently stored in warehouse 1990 vintage.

Epitaxial (EPI) reactor.

HDP CVD System, 8", 2006 vintage.

Epitaxial (EPI) reactor 1996 vintage.

Vapor deposition systems.

DLH CVD System, 8" (4) Chambers.

CVD System, 8" (4) Chambers 1998 - 2000 vintage.

CVD System, 8" Process: DxL (2) Chambers.

MOCVD System, 13x4" ( 5x6") MO Source line: TMGa-1, TMGa-2, TMIn-1, TMIn-2, TMAl-1, TMAl-2, Cp2Mg, DEZn Hydride source line: (1) AsH3, (1) PH3, (2) Dopant A Si2H6, (1) Dopant B spare Veeco real temp pyrometers Ebara A70 multi-stage vacuum pump (5) RE215 Thermal baths (1) RE221 Thermal bath Currently installed 2009 vintage.

System, 8" (1) Chamber, SSD 2000 vintage.