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1615 RESULTS FOUND FOR: used Reactors

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  • AIXTRON 2400 G2

    AIXTRON: 2400 G2

    GaAr/InP Planetary reactor systems Set up to run Red LED's Configured for 8x3"(15x2") wafers Source configuration: TMGa-1, TMGa-2, TMAl-1, TMAl-2, TMIn-1, TMIn-2,Cp2Mg-1 Currently deinstalled 1998 vintage.
  • AIXTRON AIX 2400/2600 G3

    AIXTRON: AIX 2400/2600 G3

    MOCVD system LED Chip 2001 vintage.
  • AIXTRON Crius 31x2"

    AIXTRON: Crius 31x2"

    System 2008 vintage.
  • AIXTRON Crius 31x2"

    AIXTRON: Crius 31x2"

    MOCVD System 2009 vintage.
  • AIXTRON Crius 31x2"

    AIXTRON: Crius 31x2"

    MOCVD System Integrated concept (IC) 2008 vintage.
  • AIXTRON: Crius I

    31x2" GaN System (1) EpiTT Mikron M680 Thermal baths: (2) RM 25S and (6) RM 6S Source Configuration TMGa-1 TMGa-2 TMAl-1 Cp2Mg-1 Cp2Mg-2 TMIn-1 TMIn-2 TEGa-1 CBr4-1 DTBSi source lines 2008 vintage.
  • AIXTRON: TS OCSH 30X2

    System 2007 vintage.
  • AMAT / APPLIED MATERIALS Centura
  • AMAT / APPLIED MATERIALS Centura

    AMAT / APPLIED MATERIALS: Centura

    WCVD System, 8" WxZ Optima (4) Chambers 1998 vintage.
  • AMAT / APPLIED MATERIALS: Centura 5200

    DLH CVD System, 8" (4) Chambers.
  • AMAT / APPLIED MATERIALS Centura Epi

    AMAT / APPLIED MATERIALS: Centura Epi

    System, 12" Atmospheric 2-chamber frame (1) Chamber only Power rack Gas panel Missing parts: (1) Chamber Upper and lower lamp module MF robot and controller.
  • AMAT / APPLIED MATERIALS: Centura Gigafill

    SACVD BPSG System, 8", 2000 vintage.
  • AMAT / APPLIED MATERIALS Centura Tectra TxZ

    AMAT / APPLIED MATERIALS: Centura Tectra TxZ

    CVD System, 8" (4) Chambers 1998 - 2000 vintage.
  • AMAT / APPLIED MATERIALS Centura Ultima HDP

    AMAT / APPLIED MATERIALS: Centura Ultima HDP

    CVD System, 8" System general: Mainframe: Centura 5200 DCVD Wafer type: Notch Chamber position A, B, C: HDP Ultima plus chamber, 8" Chamber E position: Multi-slot cool down chamber Chamber F position: Wafer orienter chamber System controllers: SBC V452 Board VGA Board P3 Board Facility & safety configurations: EMO Switch type: Turn to release EMO EMO Guard ring EMO Shunt trip Bracket standoff adapter Water and smoke detect output: Alarm Facility power indicator System water leak detector Main frame: Facilities type: Phase II System placement: Stand Alone Front panel: Steel white polymer finish Facilities connection: VCR Facilities orientation: Mainframe facilities bottom connection Facilities water: Phase II water Controller IO interface option: I/O Expansion base card with seriplex gas panel card Interface: GEM interface SMIF Robot: ASYST LPT 2200 With flurotrac Interface type: SMIF ASYST SMIF Robot Load lock chamber: Type: Wide body integrated with SMIF SMIF Integration: ASYST LPT (Load port transfer) 2200 Cassette type supported: KA200-85MTR-47C02 Loadlock platform: Universal Wafer out of cassette detector Cassette present sensor Auto rotation Wafer mapping: Enhanced fast wafer mapping Loadlock slit valve O'ring type: KALREZ Indexer type: Stepper control Integrated cassette sensor Loadlock vent and exhaust: Side vent Dedicated loadlocks rough pump: EDWARDS Pump Interface Transfer chamber: Transfer chamber manual lid lift Transfer chamber sensor Process chamber slit valve A, B, C: Bonded door with KALREZ O'ring Robot type: HP+ Robot (Dual speed) Basic wafer on blade detector N2 Purge MFC type: Unit instrument (UFC-1661) 1L Buffer purge slow vent flow: 500 sccm Dedicated transfer rough pump: EDWARDS Pump interface Mainframe inert gas lines: Chamber N2 supply Chambers N2 surface finish: 10 Ra Mainframe N2 supply Mainframes N2 surface finish: 10 Ra Chamber A configuration: Type: HDP Ultima plus chamber Frequency type: Top, side and bias RF Heater type: 0190-46458 Thermalogic board Manometer type: DUAL 10/100 TORR MKS Throttle valve: Turbo throttle valve plus rough throttle valve Gate valve type: 3870-04276, Pendulum ISO250 Actuator 52.3 Turbo pump type: EBARA ET1600W Turbo pump controller: 1604W Turbo pump ring type: 0010-11762, CTR Ring assy, HDP-CVD Ultima plus Chamber O'ring type: KALREZ 9100 Clean method: RPS 0190-26744, MKS Astroni AX7670 Clean gas: NF3 EDWARDS Rough pump interface Chamber A process kit: 0010-03090 ESC Cathode (WTM Type) 0040-18219 ESC (WTM Type) 0190-18430 WTM Probe 0200-18109 Collar 0200-18081 Cover ceramic 0200-01009 Top nozzle 0200-18093 Side nozzle 0200-01006 Dome 0040-04650 Gas ring with (24) nozzles 0200-40156 Lift pin ceramic Chamber B configuration: Type: HDP Ultima plus chamber Frequency type: Top, side and bias RF Heater type: 0190-46458 Thermalogic board Manometer type: Dual 10/100 TORR MKS Throttle valve: Turbo throttle valve plus rough throttle valve Gate valve type 3870-04276, Pendulum ISO250 Actuator 52.3 Turbo pump type: EBARA ET1600W Turbo pump controller: 1606W TF Turbo pump ring type: 0010-11762, CTR Ring assy, HDP-CVD Ultima plus Chamber o ring type: KALREZ 9100 Clean method: RPS 0190-26744RPS, MKS Astroni AX7670 Clean gas: NF3 EDWARDS Rough pump interface 0010-03090 ESC Cathode (WTM Type) 0040-18219 ESC (WTM Type) 0190-18430 WTM Probe 0200-18109 Collar 0200-18081 Cover ceramic 0200-01009 Top nozzle 0200-18093 Side nozzle 0200-01006 Dome 0040-04650 Gas ring with 24 unit nozzles 0200-40156 Lift pin ceramic Gas panel configurations: Gas panel type: HP 10 Ra Cabinet exhaust: Top exhaust Gas panel door Gas feed: Single-line drop (Bottom feed) Valve type: FUJIKIN 5 Ra max Filter: MILLIPORE Ni 10 ra max Fitting: VCR MFC: SEC-4400 MC (D-Sub 9 pins) Veriflo Regulator MKS Transducer with display unit Gas line configuration chamber A, B, C: Gas pallet: HDP Ultima plus Gas feed: Single-line drop (Bottom feed) Automatic gas line purging capability Gas 1: SiH4, 200 sccm Gas 2: NF3, 2000 sccm Gas 3: SiH4 Top, 20 sccm Gas 4: SIF4, 20 sccm Gas 5: AR Top, 50 sccm Gas 6: AR, 300 sccm Gas 7: HE, 200 sccm Gas 8: SIF4, 100 sccm Gas 9: O2, 400 sccm Gas 10: AR-MW, 2000 sccm System controller: Controller Type: Phase I Controller Controller GFCI: 30MA GFCI Controller UPS: Facilities ups interface Controller electrical interface: Top feed AC cables Controller exhaust: Top exhaust Cursor type: Blinking cursor Heat exchanger type: SMC Themo chiller, INR-498-001D Heat exchanger water fittings: Stainless steel Generator rack: Chamber A, B, & C top RF generator: ENI NOVA-50A Chamber A, B & C side RF generator: ENI NOVA-50A Chamber A, B & C bias RF generator: ENI GHW-50A Dry pumps: EDWARDS Pump EDWARDS Pump interface Loadlock chamber pump: EDWARDS IL70 Transfer chamber pump: EDWARDS IL70 Rough pump chamber A, B, C: EDWARDS IH600 Power: 200/208 VAC, 50 Hz, 400A 2001 vintage.
  • AMAT / APPLIED MATERIALS 7710

    AMAT / APPLIED MATERIALS: 7710

    Epitaxial (EPI) reactor 1996 vintage.
  • AMAT / APPLIED MATERIALS 7800

    AMAT / APPLIED MATERIALS: 7800

    Epitaxial (EPI) reactor.
  • AMAT / APPLIED MATERIALS: Centura

    CVD systems, 8" DCVD (4) Chambers: ACL.
  • AMAT / APPLIED MATERIALS: Endura 5500

    MOCVD System, 8" (2) IMP (2) HP (2) PC II NBLL, HP 1995 vintage.
  • AMAT / APPLIED MATERIALS: Endura 5500

    PVD System, 8" 1998 vintage.
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