Reactors

GaAr/InP Planetary reactor systems Set up to run Red LED's Configured for 8x3"(15x2") wafers Source configuration: TMGa-1, TMGa-2, TMAl-1, TMAl-2, TMIn-1, TMIn-2,Cp2Mg-1 Currently deinstalled 1998 vintage.

MOCVD system LED Chip 2001 vintage.

System 2008 vintage.

MOCVD System 2009 vintage.

MOCVD System Integrated concept (IC) 2008 vintage.

31x2" GaN System (1) EpiTT Mikron M680 Thermal baths: (2) RM 25S and (6) RM 6S Source Configuration TMGa-1 TMGa-2 TMAl-1 Cp2Mg-1 Cp2Mg-2 TMIn-1 TMIn-2 TEGa-1 CBr4-1 DTBSi source lines 2008 vintage.

System 2007 vintage.

WCVD System, 8".

WCVD System, 8" WxZ Optima (4) Chambers 1998 vintage.

DLH CVD System, 8" (4) Chambers.

System, 12" Atmospheric 2-chamber frame (1) Chamber only Power rack Gas panel Missing parts: (1) Chamber Upper and lower lamp module MF robot and controller.

SACVD BPSG System, 8", 2000 vintage.

CVD System, 8" (4) Chambers 1998 - 2000 vintage.

CVD System, 8" System general: Mainframe: Centura 5200 DCVD Wafer type: Notch Chamber position A, B, C: HDP Ultima plus chamber, 8" Chamber E position: Multi-slot cool down chamber Chamber F position: Wafer orienter chamber System controllers: SBC V452 Board VGA Board P3 Board Facility & safety configurations: EMO Switch type: Turn to release EMO EMO Guard ring EMO Shunt trip Bracket standoff adapter Water and smoke detect output: Alarm Facility power indicator System water leak detector Main frame: Facilities type: Phase II System placement: Stand Alone Front panel: Steel white polymer finish Facilities connection: VCR Facilities orientation: Mainframe facilities bottom connection Facilities water: Phase II water Controller IO interface option: I/O Expansion base card with seriplex gas panel card Interface: GEM interface SMIF Robot: ASYST LPT 2200 With flurotrac Interface type: SMIF ASYST SMIF Robot Load lock chamber: Type: Wide body integrated with SMIF SMIF Integration: ASYST LPT (Load port transfer) 2200 Cassette type supported: KA200-85MTR-47C02 Loadlock platform: Universal Wafer out of cassette detector Cassette present sensor Auto rotation Wafer mapping: Enhanced fast wafer mapping Loadlock slit valve O'ring type: KALREZ Indexer type: Stepper control Integrated cassette sensor Loadlock vent and exhaust: Side vent Dedicated loadlocks rough pump: EDWARDS Pump Interface Transfer chamber: Transfer chamber manual lid lift Transfer chamber sensor Process chamber slit valve A, B, C: Bonded door with KALREZ O'ring Robot type: HP+ Robot (Dual speed) Basic wafer on blade detector N2 Purge MFC type: Unit instrument (UFC-1661) 1L Buffer purge slow vent flow: 500 sccm Dedicated transfer rough pump: EDWARDS Pump interface Mainframe inert gas lines: Chamber N2 supply Chambers N2 surface finish: 10 Ra Mainframe N2 supply Mainframes N2 surface finish: 10 Ra Chamber A configuration: Type: HDP Ultima plus chamber Frequency type: Top, side and bias RF Heater type: 0190-46458 Thermalogic board Manometer type: DUAL 10/100 TORR MKS Throttle valve: Turbo throttle valve plus rough throttle valve Gate valve type: 3870-04276, Pendulum ISO250 Actuator 52.3 Turbo pump type: EBARA ET1600W Turbo pump controller: 1604W Turbo pump ring type: 0010-11762, CTR Ring assy, HDP-CVD Ultima plus Chamber O'ring type: KALREZ 9100 Clean method: RPS 0190-26744, MKS Astroni AX7670 Clean gas: NF3 EDWARDS Rough pump interface Chamber A process kit: 0010-03090 ESC Cathode (WTM Type) 0040-18219 ESC (WTM Type) 0190-18430 WTM Probe 0200-18109 Collar 0200-18081 Cover ceramic 0200-01009 Top nozzle 0200-18093 Side nozzle 0200-01006 Dome 0040-04650 Gas ring with (24) nozzles 0200-40156 Lift pin ceramic Chamber B configuration: Type: HDP Ultima plus chamber Frequency type: Top, side and bias RF Heater type: 0190-46458 Thermalogic board Manometer type: Dual 10/100 TORR MKS Throttle valve: Turbo throttle valve plus rough throttle valve Gate valve type 3870-04276, Pendulum ISO250 Actuator 52.3 Turbo pump type: EBARA ET1600W Turbo pump controller: 1606W TF Turbo pump ring type: 0010-11762, CTR Ring assy, HDP-CVD Ultima plus Chamber o ring type: KALREZ 9100 Clean method: RPS 0190-26744RPS, MKS Astroni AX7670 Clean gas: NF3 EDWARDS Rough pump interface 0010-03090 ESC Cathode (WTM Type) 0040-18219 ESC (WTM Type) 0190-18430 WTM Probe 0200-18109 Collar 0200-18081 Cover ceramic 0200-01009 Top nozzle 0200-18093 Side nozzle 0200-01006 Dome 0040-04650 Gas ring with 24 unit nozzles 0200-40156 Lift pin ceramic Gas panel configurations: Gas panel type: HP 10 Ra Cabinet exhaust: Top exhaust Gas panel door Gas feed: Single-line drop (Bottom feed) Valve type: FUJIKIN 5 Ra max Filter: MILLIPORE Ni 10 ra max Fitting: VCR MFC: SEC-4400 MC (D-Sub 9 pins) Veriflo Regulator MKS Transducer with display unit Gas line configuration chamber A, B, C: Gas pallet: HDP Ultima plus Gas feed: Single-line drop (Bottom feed) Automatic gas line purging capability Gas 1: SiH4, 200 sccm Gas 2: NF3, 2000 sccm Gas 3: SiH4 Top, 20 sccm Gas 4: SIF4, 20 sccm Gas 5: AR Top, 50 sccm Gas 6: AR, 300 sccm Gas 7: HE, 200 sccm Gas 8: SIF4, 100 sccm Gas 9: O2, 400 sccm Gas 10: AR-MW, 2000 sccm System controller: Controller Type: Phase I Controller Controller GFCI: 30MA GFCI Controller UPS: Facilities ups interface Controller electrical interface: Top feed AC cables Controller exhaust: Top exhaust Cursor type: Blinking cursor Heat exchanger type: SMC Themo chiller, INR-498-001D Heat exchanger water fittings: Stainless steel Generator rack: Chamber A, B, & C top RF generator: ENI NOVA-50A Chamber A, B & C side RF generator: ENI NOVA-50A Chamber A, B & C bias RF generator: ENI GHW-50A Dry pumps: EDWARDS Pump EDWARDS Pump interface Loadlock chamber pump: EDWARDS IL70 Transfer chamber pump: EDWARDS IL70 Rough pump chamber A, B, C: EDWARDS IH600 Power: 200/208 VAC, 50 Hz, 400A 2001 vintage.

Epitaxial (EPI) reactor 1996 vintage.

Epitaxial (EPI) reactor.

Epitaxial reactors.

CVD systems, 8" DCVD (4) Chambers: ACL.

MOCVD System, 8" (2) IMP (2) HP (2) PC II NBLL, HP 1995 vintage.

PVD System, 8" 1998 vintage.