Used GASONICS / NOVELLUS HIPOX #293770796 for sale

GASONICS / NOVELLUS HIPOX is a highly advanced diffusion furnace specifically designed to meet the needs of semiconductor device fabrication. This equipment works by evaporating a solid material, such as silicon, onto a surface by either a chemical or physical vapor deposition (CVD/PVD) process. The evaporation process, or "diffusion", is performed in a vacuum chamber containing inert gas. The surfaces of the substrate to be coated are maintained at a controlled temperature while the evaporated material is driven onto them. The system is built upon a closed-loop hot-frame design, where the process chamber is mounted on a frame and heated by two internal heating elements. Heating is controlled via an inert gas mixture that is introduced into the chamber and the vapors are exhausted via a partially vacuumed exhaust unit. Vaporized material is driven through the chamber by means of a hot-gas dynamic machine, which ensures an even distribution of the material over the surface. GASONICS HIPOX tool offers a variety of process possibilities, allowing the user to accurately tailor its process conditions to their specific application. It is supported with integrated process monitoring and control capabilities, capable of fitting detectors in the chamber to monitor parameters of the process such as pressure, temperature and gas flow. The asset is powered by its own independently controlled three-phase power supply. The robust design of NOVELLUS HIPOX model ensures high process yields and yields excellent micro-precise deposition. Additionally, the equipment offers two oven heating functions - flash heating, for short term applications, and bottom heating, for more precise long term applications. The system also features a pre-heating chamber to ensure that the process temperatures are consistently maintained. HIPOX diffusion furnace is a well-designed and highly efficient unit, capable of providing repeatable dynamic coating for high-precision component fabrication at high speeds. It can accommodate a wide range of substrate sizes and can be adjusted to meet the most stringent process requirements. Its comprehensive process monitoring and control capability adds to its efficiency, while the frame design and robust construction ensure reliable performance. This machine is ideal for applications that require high levels of precision and repeatability, as well as high- quality surface finishing.