Used HITACHI / KOKUSAI DJ-1206VN-DF #9377433 for sale

HITACHI / KOKUSAI DJ-1206VN-DF
ID: 9377433
Wafer Size: 12"
Vintage: 2012
PECVD System, 12" Process: ALD 2012 vintage.
HITACHI / KOKUSAI DJ-1206VN-DF is a state-of-the-art diffusion furnace with advanced features for a wide range of applications. The diffusion furnace uses an advanced vacuum equipment to deposit thin film layers on wafers. This technology is used for high-performance devices, such as microprocessors, as well as for large-scale production of integrated circuits. HITACHI DJ-1206VN-DF offers exceptional accuracy to meet high-precision processing requirements. This is due to its high-quality vacuum system capable of achieving a holding vacuum of 1 x 10-7 Torr. Additionally, the diffusion furnace features an incredible temperature uniformity of ±1°C and can reach temperatures up to 1250°C. In addition to the temperature uniformity, KOKUSAI DJ-1206VN DF is equipped with an insulation unit that is tuned to efficiently transfer internal heat and reduce thermal instability. This ensures a consistent and accurate temperature profile during processing which leads to a higher yield of high-quality products. KOKUSAI DJ-1206VN-DF also features an integrated graphite susceptor with molybdenum and graphite shields to provide an effective buffer against heat radiation. The susceptor is raised and lowered on rails in order to more easily introduce and extract process substrates and wafers. Furthermore, the diffuser is equipped with a rotary motorized turntable to better rotate wafers through the susceptor in order to obtain more consistent deposition. DJ-1206VN DF also includes an integrated power control unit (PCU) that can be used to monitor and monitor and measure the electrical power absorption of the machine through predefined setpoints. This helps increase accuracy and repeatability of the processing results. Lastly, HITACHI DJ-1206VN DF is further enhanced by a number of accessories to provide the user with a comprehensive tool for diffusion processes. Included are a liquid nitrogen source, a gas supply asset, and a process gas monitoring model. The diffusion furnace also includes features such as automated process control, as well as process mapping and tuning algorithms to ensure the best possible processing results. In conclusion, DJ-1206VN-DF is an exceptional diffusion furnace with advanced features and accessories. Its high-precision vacuum equipment, temperature uniformity, insulation system, and integrated graphite susceptor combine to provide an efficient and accurate unit. Additionally, a range of accessories, including a liquid nitrogen source and process gas monitoring machine, further expand the potential of the tool. Together, these features make HITACHI / KOKUSAI DJ-1206VN DF an ideal choice for any diffusion-based process.
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