Used AMAT / APPLIED MATERIALS Centura Ultima HDP CVD #9063643 for sale
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ID: 9063643
Wafer Size: 8"
Vintage: 2000
Etcher, 8"
(2) Ultima chamber
(1) Ultima plus chamber
Technology :IMD
Wafer Size : 8"
Wafer Shape : SNNF (Semi Notch No Flat)
Software Version : B4.3.14
CHAMBER TYPE AND LOCATION
Ch A : Ultima HDP-CVD
Ch B : Ultima HDP-CVD
Ch C : Ultima + HDP-CVD
Ch E : Multislot Cool Down
Ch F : Orientor
CHAMBER A,B Ultima HDP-CVD :
Nozzle : Long/Long Side
Clean Gas Distribution : Baffle
Turbo Pump : Ebara ET1600WS w/ HVA
Wafer Temperature Monitoring : Yes
Top Gas Feed : Without Top O2
Dual Independent He Control : Standard 10/10 TORR
Clean Method : Microwave
CHAMBER C - Ultima + HDP-CVD :
Nozzle : Long/Long Side
Clean Gas Distribution : Baffle
Turbo Pump : Ebara ET1600WS w/ HVA
Wafer Temperature Monitoring : Yes
Top Gas Feed : Without Top O2
Dual Independent He Control : Standard 10/10 TORR
Clean Method : Top Mount
EXISTING ELECTRICAL REQUIREMENTS
Line Frequency : 60Hz
Line Voltage : 200/208V
Line Amperage : 600A Platform
EXISTING SAFETY EQUIPMENT :
EMO type : Turn to release EMO
EMO Guard Ring : Yes
System Labels : English w/Chinese Non-simplified
System Smoke Detector : Controller
EXISTING MAINFRAME :
Mainframe Type : Ultima HDP w/Multislot
Frame Type : Standard Frame
System Placement : Through the Wall
Mainframe Skins : No
Mainframe Exhaust Duct : No
Mainframe Facilities Connection : Back
Robot Type : HP Robot
Robot Blade : Ceramic
Loadlock Cassette : Narrow Body
Narrow body Loadlocks : Cassette Present Sensor
Loadlock Wafer Mapping : Basic
N2 Purge Type : STEC 4400MC 10 Ra Max
EXISTING GAS DELIVERY :
Gas Panel Surface Finish : Standard Gas Panel
MFC Type : STEC 4400MC 10 Ra Max
Valves : Fujikin 5 Ra Max
Filters : Pall Ni 10 Ra Max
Transducers : MKS w/ Display
Regulators : Veriflo
System Cabinet Exhaust : Top
Gas Panel Gas/Flow Direction Labels : Yes
APC Seriplex Cover : Yes
Gas Panel Doors : Solid
Gas Pallet Configuration :
Chamber A, B, C
Gas Stick/Process Gas/MFC size/Regulator/Transducer
#1 SiF4 100 Y Y
#2 O2 400 Y Y
#3 SiH4 200 Y Y
#4 Ar 300 Y Y
#5 SiH4 20 Y Y
#6 Ar 50 Y Y
#7 NF3 2000 Y Y
#8 Ar 2000 Y Y
REMOTES :
RF Generator Rack - Ultima Gen. Rack
ASTEX 80S09mW (3)
Quantity : Two
Ultima Stand-Alone RF Generator Rack : Yes
Generator Rack Cooling - RF Gen Rack Manifold with Quick Disconnect Ultima Gen Rack H20 Connection - Barbed Brass
Existing Heat Exchanger : SMC Thermo
Umbilicals :
System Controller Signal Cable Length : 55ft
RF Gen Rack Cable Length : 50ft
Ultima Stand-Alone Generator Rack : 98 ft
HX Hose Length : 50ft
HX Cable Length : 50ft
Pump Cable : 50ft
Ultima Microwave Generator Cable Length : 50 ft
Ultima WTM Cable Length : 32.8 ft (10m)
Vacuum Pumps, Exhaust Scrubber not included in sale
Currently crated and stored
System Can be inspected
1999-2000 vintage.
AMAT / APPLIED MATERIALS Centura Ultima HDP CVD (High-Density Plasma Chemical Vapor Deposition) reactor is a modular, low-cost, vertical furnace designed for high-volume, high-throughput production of cutting-edge thin-film materials. The reactor features an innovative patented design that uses high densities of plasma over a large volume, enabling faster deposition rates and higher yield rates. The technology also offers low parasitics and improved uniformity of deposition, making it an excellent choice for use in applications such as solar cells, flat panel displays, optical coatings, and advanced semiconductor devices. AMAT Centura Ultima HDP CVD reactor uses RF-driven high-density plasma (HDP) to drive reactions at low temperatures, making it energy-efficient and ideal for producing high-performance thin-film coatings. The technology also eliminates many of the costly material handling and cleaning steps traditionally associated with CVD processes, minimizing costs and boosting overall yields. The equipment is highly configurable, allowing for a wide range of plasma sources and materials—including metal and dielectric targets, dielectric compounds, and gas targets—to be used in a selectable sequence. At the heart of APPLIED MATERIALS Centura Ultima HDP CVD reactor is the sub-module, or work-space, which is a fully enclosed chamber with a single plasma source and an integrated gas care system. This gas care unit ensures that the continuous flow of gases used in the deposition process is always at optimal levels for accurate results. A centrally-mounted target holder ensures that the substrate to be coated is rotated by the plasma without any obstruction for optimal uniformity in the deposition process. The high-density plasma, coupled with uniform deposition, ensures that the temperature of the substrate remains low and uniform, preserving the material's properties while ensuring a high-quality, precisely-patterned deposition across the surface. The machine's advanced control software provides an intuitive user interface, allowing for precise control over process parameters and allows for targeted optimization of the deposition process. Centura Ultima HDP CVD reactor is an excellent choice for any production line involving cutting-edge thin-film deposition. Thanks to its innovative and cost-effective design, high-throughput production is enabled at low cost and minimal overhead. This makes the tool an attractive choice for industrial manufacturers looking to realize the full potential of thin-film deposition and improved device performance.
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