Used AMAT / APPLIED MATERIALS P5000 Mark II #9213673 for sale

AMAT / APPLIED MATERIALS P5000 Mark II is a multi-chamber, multi-zone, in-situ deposition reactor. It is specifically designed for high-throughput deposition of a variety of thin film materials in ultra-high vacuum. AMAT P5000 Mark II features an advanced micro-zone technology which provides excellent homogeneity and temperature uniformity throughout the entire deposition area. This ensures accurate and reproducible thin-film deposition results. The equipment features extraordinary uniformity and deposition rate. The system includes two independent vacuum chambers, which enable users to optimize the deposition conditions for both thin film deposition and thin-film etching on multiple substrates simultaneously. The advanced high-speed motion control equipped in APPLIED MATERIALS P 5000 MARK II optimizes substrate position, crystal growth direction and particle deposition. Furthermore, advanced heating options such as infra-red heating, ultra-low emission thermal evaporation and rapid thermal annealing are available for different thin film processes. AMAT / APPLIED MATERIALS P 5000 MARK II is engineered for top-notch performance with a robust vacuum environment. The unit features an automated re-crystallization process with indium tin oxide coated components, a low-cost direct view ion source, and the world's first end-point detection systems with advanced reflectometry measurements. This enables the machine to automatically adjust process conditions based on feedback from various in-situ monitoring systems. AMAT P 5000 MARK II is also highly regarded for its automated in-situ scanning electron microscope, which enables fast deposition and characterization of any process caused by the tool. P5000 Mark II provides superior process control with flexibility and scalability. The advanced software suite and integrated integration capabilities allow users to transfer recipes from different reactors or to use recipes from one process to another when changing environment or substrate. The asset is designed with a high level of process flexibility and different materials combinations for a broad range of deposition processes. In conclusion, P 5000 MARK II is an advanced multi-chamber, multi-zone reactor that is specifically designed for ultra-high-vacuum thin-film deposition of a variety of materials. The model enables superior process control with flexibility, scalability, scalability and excellent homogeneity due to its advanced micro-zone technology. The equipment also includes a range of advanced features, such as an automated re-crystallization process, indium tin oxide components, low-cost direct view ion source, and end-point detection, to ensure that each process is accurately and reliably delivered.