Used CANON / ANELVA I-1060 SVII Plus 1 #9120224 for sale

ID: 9120224
Vintage: 1996
System Configuration: L1 Etch chamber Turbo pump: Osaka TG-550 RF: WMA-1, double frequency L2 Deposition chamber Cryo pump: CAP83R DC Power: PDC-870D L3 Deposition chamber Cryo pump: CAP83R DC Power: PDC-609 R3 Deposition chamber Cryo pump: CAP83R DC Power: PDC-307E R2 Despostion chamber Cryo pmp: CAP83R DC Power: PDC-307E R1 Degas chamber Lamp heater: 400°C L/L Left chamber Cryo pump: CAP83R L/L Right chamber Cryo pump: CAP83R Includes: Edwards dry iQDP80 Cryo compressor CRC 874 Main control rack operation rack RF Generator rack DC Power supply rack UPS PS1203 PVD Rack 1996 vintage.
CANON / ANELVA I-1060 SVII Plus 1 is a state-of-the-art multi-purpose sputtering equipment designed to carry out both physical and chemical sputtering processes. This high-performance sputter system is capable of producing a variety of applications for materials, such as thin films, multilayers and composites. It is ideal for use in industries requiring precision sputtering, such as MEMS (Micro-Electro Mechanical Systems) applications, semiconductors, sensors and optoelectronics. The unit uses a Medium Frequency Power Supply (MFPV), which is designed to reduce machine size while maintaining the highest possible microwave power output. This enables uniformity of the sputtering process, even at high sputtering rates. CANON I-1060SVII PLUS-1 consists of a top-mount main tool (including source, switch, and chamber) and an ergonomically designed operator console. It also has a bottom-mount Magnetron sputtering head and source, as well as matched independent sputter source and target assemblies. The asset also features ground-breaking measurement and control capabilities, such as Automatic Power Feedback, Digimatic Control, high-speed process control, and a data logging model. This ensures precise control of the sputter deposition rates, as well as the ability to record information for process optimization and improved process capability. The sputter head and source are designed to maximize uniformity and repeatability, as required for many applications. It is capable of producing extremely small sputter particles sizes, making it capable of producing uniform nanostructured thin films—a great advantage for advanced electronics, sensors and MEMS products. The equipment provides exceptional flexibility to accommodate a wide variety of sputtering process requirements, with the ability to customize each application. This includes automatic target exchange, dual source sputtering, shut-down and resume-start operations, and nozzle cleaning operations to ensure the highest productivity and reliability of the system. ANELVA I-1060 SVII PLUS-1 has all the features required for the highest throughput, precision and reliability for surface processing.
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