Used LAM RESEARCH / NOVELLUS Speed #293615958 for sale

LAM RESEARCH / NOVELLUS Speed
ID: 293615958
Wafer Size: 12"
Vintage: 2007
CVD System, 12" 2007 vintage.
LAM RESEARCH / NOVELLUS Speed is an etching and ashing equipment for semiconductor wafer fabrication processing. NOVELLUS Speed platform offers advanced process capability and flexibility for both etch and ash applications. It combines LAM's advanced Plasma-Etch system and NOVELLUS CoreAsh Patterning technologies. This platform is designed for the latest CMOS and semiconductor product technologies, including 3D NAND, Unit-on-Chip (Soc), MEMS, RF and RF-SOI. LAM RESEARCH Speed platform offers the highest etch and ash throughput on the market, enabling customers to maximize productivity and minimize downtime. With its advanced technology, it is designed to minimize particle contamination, ensure tight film thickness control, and deliver extremely low particle concentrations. The machine offers the best scalability and repeatability in the industry, while offering maximum process flexibility across all semiconductor processes. Speed has a wide range of applicability, including plasma etching, dry etching, patterning, lithography, planarization and ion milling. The plasma etch chambers are designed to provide the highest uniformity in the industry, with the ability to fine-tune etch processes to get the best results. The RF power supplies can be used for both etch and ash processes, delivering a wide range of process options. The ash chamber is designed to provide consistent ash rate across multiple wafers, enabling electrical characteristics to be controlled for a wide range of applications. The tool has excellent process control capabilities, enabling tight control of film thickness and particle concentration. The asset can be run in either Open or Closed Loop modes, with each providing its own advantages. The Open Loop mode allows for the most flexibility, while the Closed Loop mode provides the highest performance and yield. Additionally, LAM RESEARCH / NOVELLUS Speed combines both model-level and process-level technologies to optimize process parameters in real-time. This provides improved throughput and yield performance with reduced wait-times between cycles. NOVELLUS Speed platform provides a comprehensive solution for the most advanced semiconductor processing. It offers the highest etch and ash throughput available, tight film thickness control, and the best scalability to deliver the highest yields in the industry. With its advanced control systems and powerful process platforms, LAM RESEARCH Speed platform is the ideal choice for customers looking to maximize process flexibility and throughput.
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