Used LAM RESEARCH / NOVELLUS Speed #293819068 for sale

LAM RESEARCH / NOVELLUS Speed
ID: 293819068
High-Density Plasma Chemical Vapor Deposition (HDP-CVD) System.
LAM RESEARCH / NOVELLUS Speed is an etcher / asher that is used for the etching, deposition and clean steps in semiconductor fabrication, with features that make it ideal for advanced technologies. It is an advanced tool for reactive ion etching, chemical vapor deposition, atmospheric pressure dry etching, decoupled plasma etching and clean processes in the semiconductor production. NOVELLUS Speed utilizes two-dimensional parallelism to increase throughput and process LAM RESEARCH Speed with higher accuracy and yield in the etch-and-deposition process. This tool is scalable to accommodate future technology advancements, enabling users to quickly replace hardware to maintain competitive production speeds. Speed integrates the most advanced drug formulation technology to safely and accurately control the transport of particles through the equipment without generating pollutants. This technology allows the system to transport fine particles required for the etching and deposition process without creating harmful emissions or producing byproducts with low througput yields. LAM RESEARCH / NOVELLUS Speed also features an advanced software control unit that ensures step-by-step accuracy when controlling the etching and deposition process parameters. This software-driven machine allows users to create custom tailored processes to meet specific performance and quality requirements for different substrate materials and processes. NOVELLUS Speed also has the ability to integrate wet bench operations into the single vacuum tool, eliminating the need for additional wet bench processing and facilitating the transfer of process information between the wet bench and the main asset. This ability facilitates the more efficient and cost effective execution of etch and deposition processes. Overall, LAM RESEARCH Speed is an advanced etcher / asher that is well-suited for advanced process technologies, due to its two-dimensional parallelism for increased throughput, cutting-edge drug formulation technology for controlling particle transport, and its software control model for tailored process creation. It also has the ability to integrate wet bench operations into the equipment, making it even more efficient and cost effective.
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