Used LAM RESEARCH / NOVELLUS Speed #9293848 for sale

LAM RESEARCH / NOVELLUS Speed is an etching and ashing tool used in the semiconductor manufacturing industry. It is designed to deliver high throughput by leveraging innovative technologies that allow for faster patterning. The system utilizes a two-step process for etching and ashing, which begins with a chemical etch step. During this step, a plasma is generated in a vacuum chamber within NOVELLUS Speed platform. Chemical compounds, such as Cl2, are then introduced to the plasma, resulting in a high-precision etching process. The etched features are then protected by a post etch protective film, which allows for subsequent ashing and stripping steps. The ashing step utilizes a unique, three-way combination of O2, He and Ar, to deliver a clean and efficient ashing process without the need for excessive particle buildup. In addition, LAM RESEARCH Speed platform is capable of controlling the pressure within the chamber, ensuring accurate etching and ashing conditions. Speed's advanced algorithm also allows the platform to make independent decisions on how to appropriate the chamber's pressure and temperature to optimize etching and ashing results. LAM RESEARCH / NOVELLUS Speed is well-suited for a variety of processes, and can handle the most critical semiconductor patterning needs. Its high-throughput capabilities make it an attractive option for processes requiring advanced etching and ashing, such as MEMS devices, finfield-effect transistors (FETs), and very large scale integration (VLSI). Additionally, NOVELLUS Speed is capable of handling diverse wafer sizes, shapes, and thicknesses. LAM RESEARCH Speed is designed with an intuitive user-interface and also comes equipped with an adaptive measurement system, which allows the tool to provide real-time data analysis for better performance optimization. This powerful tool is also highly reliable, with a low downtime rate and consistent wafer throughput. Overall, Speed is an advanced etching and ashing system that offers high-throughput and unmatched accuracy for patterning applications. It is an ideal choice for those who require superior performance in their semiconductor manufacturing processes.