Used LAM RESEARCH / NOVELLUS Vector Express #293738977 for sale

LAM RESEARCH / NOVELLUS Vector Express is an advanced etcher and asher technology designed specifically for high-volume applications in the semiconductor industry. The equipment combines advanced etch/ash technology such as Plasma Assisted Etch/Ash (PAE) with multiple substrates, advanced barrel/pump configurations, and other supporting technologies to optimize the process. The system offers superior throughput and yields by combining several process technologies into one platform. The PAE can achieve high etch rates and low roughness with minimized defects such as wafer dishing and edge deformations. In addition, the etch and ash process is enabled through the use of multiple substrates, such as float glass, fused quartz, and Corning HDTV. Through a combination of advanced etch and ash technologies, NOVELLUS Vector Express is able to provide tight control over a variety of materials and substrates. LAM RESEARCH Vector Express platform is highly configurable and can be used to customize solutions for a variety of process requirements. The platform is composed of two main modules: Vector Processing Cell and Multi Process Controller. The Vector Processing Cell includes all the components for the etch/ash process, such as the substrate holders, vacuum chuck, plasma source, etching and ashing stations, and a cooling unit. The Multi Process Controller allows users to easily perform multiple processes, such as etching and ashing, in a single run. Vector Express also features advanced remote monitoring, diagnostics, and traceability features. Remote monitoring allows users to access all the details regarding etch/ash processes, such as etch/ash rates, temperatures, pressure, etc. Users can also trace etching recipes for traceability and reproducibility. The machine is also designed with full tool monitoring, so users can view current etch/ash counts, pressure and temperature data, and cycle counts. LAM RESEARCH / NOVELLUS Vector Express, with its advanced technologies, enables high-volume, efficient etching and ashing with tight process control and superior throughput and yields. The platform's versatility allows it to be customized to suit a wide range of process requirements, and its advanced remote monitoring and traceability features provide complete control and process management.