Used LAM RESEARCH / NOVELLUS Vector Express #293775691 for sale

ID: 293775691
Wafer Size: 12"
Vintage: 2011
System, 12" (2) BROOKS Vision 9 loader KASHIYAMA NV60N-5 Cooling pedestals in loadlocks ATM Robot Controller kit RBT / Armset, 8.4" Vortex controller IOC Controller Chase computer TEVET Cable with accessory Loadlock Process chambers: MKS AX7645RH-01 Remote Plasma Sources (RPS) MKS AX7645PS-01 Remote Plasma Sources (RPS) COMDEL CLX-2750 RF LF Generator : 2.75 KW AD-TEC AXR-2000 RF HF Generator : 2 KW Process modules: MKS Baraton 10 Torr MKS Baraton 1000 Torr Gas box: MFC number / Make / Model / Gas / MFC Size MFC1 / AERA / FC-D980C / SiH4 / 1.5 SLM MFC2 / AERA / FC-D981SBC / N2 / 1.0 SLM MFC3 / AERA / FC-D981SBC / C2H2 / 5.5 SLM MFC4 / AERA / FC-D981SBC / H2 / 10 SLM MFC5 / AERA / FC-D981SBC / He / 20 SLM MFC7 / AERA / FC-D982C / N2O / 25 SLM MFC8 / AERA / FC-D981SBC / O2 / 25 SLM MFC9 / AERA / FC-D981SBC / NF3 / 3 SLM MFCB / AERA / FC-D981SBC / N2 / 10 SLM MFCC / AERA / FC-D981SBC / Ar / 35 SLM MFCD / AERA / FC-D981SBC / Ar / 5 SLM 2011 vintage.
LAM RESEARCH / NOVELLUS Vector Express is an advanced, single-wafer etcher/ asher technology designed to provide higher performance across a wide range of applications. It is capable of performing both etch and ash steps sequentially to produce high-quality results. NOVELLUS Vector Express offers superior repeatability and ultrafast cycle times to enable efficient, higher throughput and flexibility for a variety of etch and ash applications. The machine is capable of high-throughput processing in etch processes that require good uniformity and repeatability, and is designed for precise substrate temperature control. It has an advanced modular architecture that integrates two NOVELLUS process chambers, a microwave generator and an RF generator in a single unit. LAM RESEARCH Vector Express provides fast, accurate processing of a variety of etch and ash applications, such as MEMS, compound semiconductor, silicon wafer thinning and thick metal processing. The high-throughput equipment processes small feature size (0.2um) in high aspect ratio (3:1) at an etch rate of up to 80um/min. Vector Express is capable of processing a wide range of materials including silicon, gallium arsenide, titanium nitride, organic material, aluminum, and polyimide. Additionally, its integrated multi-process chamber configuration allows for the processing of both etch and ash steps within a single cycle. LAM RESEARCH / NOVELLUS Vector Express comes pre-loaded with four process recipes, one dedicated to etch and three ashing recipes. NOVELLUS Vector Express is a precise and cost-effective etching/ ashing system that offers enhanced control over metal and organic deposition processes. It features several advanced process control features including precise temperature differential control for improved process accuracy, auto-interlock for faster substrate loading, and auto-adjustment for optimal uniformity. Additionally, the unit includes a touch-screen graphical user interface for easy operation, and an intuitive template language and interactive graphical programming which simplifies equipment setup and reduces downtime. LAM RESEARCH Vector Express is also equipped with a process monitoring and control machine that utilizes process data to eliminate potential yields and downtime. Vector Express is a advanced and reliable etching solution that offers improved uniformity and repeatability, as well as higher throughput for a range of etch and ash applications. Its integrated and modular architecture allows for excellent process control, ensuring uniform and repeatable results. The tool is reliable and easy to use, and comes pre-loaded with a number of process recipes that provide increased flexibility for etch and ash processing. Its intuitive graphical programming and process monitoring and control asset make it an ideal choice for cost-effective etching and ashing solutions.
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