Used LAM RESEARCH / NOVELLUS Vector Express #293800039 for sale

ID: 293800039
Wafer Size: 12"
Vintage: 2010
System, 12" Primary process module: SION Secondary process module: PEOX RPC Generator: Astron EX RF Configuration: SIRF Interconnect cable length: 100 ft Heated top plate Nickel-plated chamber Top plate tubing size, 1/4" Chemraz chamber gate valve Apex HF Generator: 3 kW PDX 2500 LF Generator Chemraz O-Rings Process manometer (4) Viewports Servo spindle Pedestal, 12" Minimum Contact Area (MCA): Pin and ball Carrier ring Standard shower head Rapid pin kit Gas box options: Gas box interlock: H2 on channel 3 13-Channels Non-standard system features: NSR504691 NSR505199 UI Options: Ballroom UI Location: Left 4-Color light tower Front signal tower mount: Buzzer arm mount Facial color: Sky white BROOKS AUTOMATION ATM Robot Friction end effector (2) FOUPs BROOKS Load port type BROOKS RFID Reader Mini environment lamp color: Yellow No ionizer kit TAKEX Light curtain option EMO FFU KASHIYAMA NV60 Load lock pump PC With cart Cable length: 50 feet Operating system: Windows 2000 2010 vintage.
LAMLAM RESEARCH / NOVELLUS Vector Express is an advanced high-performance etcher / asher used for various industrial applications. The equipment is designed to etch and/or ash a wide variety of semiconductor materials, including silicon and doped silica-glass. It is capable of etching features down to 10 microns in width and up to 200 microns in depth. NOVELLUS Vector Express system includes a main processing unit, a gas handling module and a remote controller. The main processing unit consists of a mass flow controller, power supplies, RF generator, load lock, and annealing station. The gas handling module supplies the process gases to the chamber, including etchant and protective, if required. The load lock can hold up to two wafers and allows fast loading and unloading of the unit. LAM RESEARCH Vector Express is equipped with different etching processes, including anisotropic wet etching for the isolation of silicon or micro pipes in glass. Its Multi Step Etch (MSE) process allows for the creation of deep trenches with the required shape without resulting in defects or breakage. It also provides a Bosch device etching process, which is a photolithography based etching process used to create the shapes required in close contact with silicon. Vector Express also offers annealing. This process allows the wafers to be patterned without cracking, reducing unwanted defects and improving yields. Depending on the material, a low-pressure rapid thermal anneal, a low-pressure RF anneal, or a low-tension RF anneal can be applied. The machine also offers the possibility to use an O2 plasma for additional desmearing and for oxide-free cleaning of the etched features. In conclusion, LAM RESEARCH / NOVELLUS Vector Express tool is a high-performance tool capable of providing high yields for various industrial applications. It offers a wide range of etching processes for different materials, including insulation and co-integration of different materials. It also offers advanced annealing processes and oxygen plasma cleaning to optimize yields and reduce defects.
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