Used LAM RESEARCH / NOVELLUS Vector Express #9099742 for sale

ID: 9099742
Wafer Size: 12"
Vintage: 2007
CVD System, 12" System configuration: Front UI System controller: MC3E, 02-257935-00 Module controller: MC3E, 02-253704-00 IOC: IOC#0,1,2,3 HDSIOC ATM Robot & controller: BROOKS RELIANCE 8 Type: Friction Controller 129974 Trust controller: C-2027-D01 ULPA Filter (3) Pod loader: Fixload 6M LL/FE Interface PCB: 03-283968-00 Loadlock configuration: (2) ATM Door valves: VAT (2) Chamber slit valves: SMC L/L Manometer: 10 Torr 750B 11TCE2GK Vacuum switch LTM type: LTM II Preheat pedestal Pedestal lift type: Servo motor (Both) Vent / Purge valve L/L On-board pump: KAWASAKI 27-283364-00 NV60N--2 PM Configuration: Module type: PSIN HF Generator: Apex 3013 LF Generator: PDX2500 LF Fixed matcher: X HF Auto matcher 27-279938-00 Navigator: 10013-L80MFI 3155162-002 D RF Distribution type: Balance kit RPC Source: Large RPC / Astron hf-s / 27-282770-00 RPC Power supply: AX7645 Pendulum valve: VAT / PM7 Controller X Pedestal: Standard type Shower head Endpoint detector: IREPD - MKS Gas box: 02-323496-00 / SRD 200107436 MFC: BROOKS SLA7950S MFC 2 N2 10000 MFC C Ar 10000 MFC 5 He 20000 MFC 1 SiH4 1500 MFC B N2 20000 MFC 6 NH3 20000 MFC 9 NF3 10000 MFC 8 O2 30000 MFC A N2O (L) 1500 MFC 7 N2O (H) 25000 Arm position detector Gauge monitoring kit Spindle type: Servo motor, 27-278697-00 Stn#1 pin lift type: Servo motor Missing parts: PM7 Controller Gauge tree Power: 208 VAC, 3 Phase Main 150A Full load 100A 2007 vintage.
LAM RESEARCH / NOVELLUS Vector Express is a high-performance etcher and asher tool used in microfabrication processes. It is a multi-chamber system with eight independent chambers capable of performing multiple process steps simultaneously. NOVELLUS Vector Express is a platform for etching dielectrics, metals, photoresists, low-k materials, along with gap filling and cleaning applications. The etcher has a high Plasma Source Power (PSP) of 1360W operating in parallel operation mode. This high power ensures successful enablement of high-speed etching processes which provide microfabrication needs by with high throughputs. Additionally, the high PSP is beneficial for etching of etching sensitive materials and hard to etch films. Moreover, LAM RESEARCH Vector Express is suitable for etching multi-layer stacks comprised of both traditional and advanced materials. Vector Express' flexibility is further enhanced through its efficient cooling system which allows its chambers to be operated within 0-110°C range. This ensures etching of nearly any material without damage or degradation of the substrate. LAM RESEARCH / NOVELLUS Vector Express' temperature-controlled roll and chuck provide uniform and precise pre-heating of the substrate to provide an even etch without pattern distortion. It has a fast wafer-climate shift of ±20°C within 5 seconds which can reduce defects and improve current yield. Moreover, its thermal control accuracy is also excellent with a stability rate of better than 0.1°C. This makes NOVELLUS Vector Express ideal for successful etching of delicate patterns and for increasing yield. LAM RESEARCH Vector Express also boasts a high degree of process control. Its process-based interface has been designed to let users control all etching parameters, such as plasma intensity, gas flow, RF frequency, pressure, and cooling mechanism. All these settings are readily available from the interface and can be monitored and adjusted to fine-tune the etching process easily. In conclusion, Vector Express is a premier etcher/asher tool which provides unsurpassed level of flexibility for etching various microfabrication materials. It is well-suited for etching high-aspect ratio features and for working on intricate micro-patterns due to its efficient temperature control and high PSP capabilities. Furthermore, its easy-to-use process-based interface facilitates easy control and monitoring of all etching parameters. All these features make LAM RESEARCH / NOVELLUS Vector Express a great choice for those looking to perform efficient, precise, and high-quality etching and ashing operations.
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