Used LAM RESEARCH / NOVELLUS Vector Express #9251477 for sale

The LAMLAM RESEARCH / NOVELLUS Vector Express is an industry leading Etcher/Asher used in high precision semiconductor device manufacturing. This machine utilizes advanced technology to achieve high throughput and accurate etching of various device layers. NOVELLUS Vector Express is equipped with trusted Samco plasma source for optimized speed and reliability which provides process stability to produce high-yield wafers with minimal defects. Its proprietary DUPMAS and SAMCOFIT algorithms also help establish stable processes. LAM RESEARCH Vector Express offers fast etching rates and accurate wafer patterning thanks to the tight control of its process variables such as power, pressure and temperature. Its advanced IXE (Ion Exchange Etching) technology also enables high etching precision by offering a broader dynamic range to control etch uniformity, even on high-aspect ratio pattern features. In addition, this system also offers efficient wafer loading and sorting capabilities. Vector Express includes a high-density inductively coupled plasma (ICP) source to provide the optimal combination of etching rate, etch anisotropy, etch selectivity, wafer uniformity, depth uniformity, and process repeatability. This system is equipped with a tight-control chuck head that holds the wafer in place during etching, preventing any backside contamination. The ICP source can be smoothly ramped up to higher powers, further reducing process time. LAM RESEARCH / NOVELLUS Vector Express can be integrated with a range of surface treatments including deposition, etching, stripping, and patterning. It also offers advanced features such as FOUP controlling capabilities for wafer transport, product traceability from FOUP to processing, and automatic stacking. Its user friendly interface offers several menu options and settings that can be tailored to suit the demands of any application. In summary, the LAMNOVELLUS Vector Express etcher/asher is an impressive machine offering high throughput and precision etching of various device layers. It's advanced IXE technology allows it to produce excellent wafers with minimal defects, and its integrated Plasma Source enables fast etching rates and extremely tight control of etch uniformity. It is highly suitable for both production and development applications.