Used LAM RESEARCH / NOVELLUS Vector Express #9270599 for sale

LAM RESEARCH / NOVELLUS Vector Express is a state-of-the-art etcher / asher, which can deposit and etch layers of varying thickness onto substrates. This innovative etcher / asher utilises a Laser Activated Macro Mechanism (LAMM) to enable user's to make ultra-precise edits to the layer composition. LAMM also dramatically reduces the cycle time needed to etch and deposit layers. NOVELLUS Vector Express is suitable for applications which require single or multiple layers of different materials, and can deposit or etch aluminum, polysilicon, silicon dioxide, silicon nitride, and tungsten materials with great precision. The etcher / asher has a maximum substrate size of 380x380mm, and can etch down to 0.5µm, with high quality on thin layers. LAM RESEARCH Vector Express features a unique tool design, which ensures consistent and repeatable etching results. The device is equipped with two pre-aligned lasers that are synchronised with the platform of the etcher. This allows for ultra-smooth plasma profiles across the etch area, controlling the rate at which the materials are etched. Vector Express also features integrated Adaptive Scanning, which allows for low-power optimization and precise etch/deposition layers. Due to the high precision and repeatability of LAM RESEARCH / NOVELLUS Vector Express, it can be used for a range of demanding etching/deposition processes. It is highly efficient and can handle substrates up to 200mm thick. The etcher is capable of high-volume production and has a maximum etch rate of up to 300 wafer per hour. Furthermore, NOVELLUS Vector Express is designed for minimal maintenance, through its easy to use user interface and fast, easy to replace parts. This state-of-the-art etcher / asher is the perfect solution for any etching / deposition process. LAM RESEARCH Vector Express is suitable for a range of applications, with its high precision, repeatability and efficiency, making it an ideal choice for any high volume production needs.