Used LAM RESEARCH / NOVELLUS Vector Express #9284871 for sale

LAM RESEARCH / NOVELLUS Vector Express is an advanced etcher/asher designed for processing a range of challenging material sets. Utilizing advanced multi-station plasma chemical etch technology, NOVELLUS Vector Express is capable of etching deep into dielectrics, metals and other material stacks. This system boasts high throughput rates and superior process control. Its' temperature zone capabilities and ultra stable proprietary bellow system reduce cycle times and enable uniform etch solutions for all the material stacks processed, Enabling tightly-driven processes and repeatable results to grow increasingly complex structures with confidence. LAM RESEARCH Vector Express features two chambers and up to three stations that can be configured for etching, deposition or annealing processes. It offers a plasma power of up to 600 watts range for high end etch capabilities, with the option to dial it down for low end etch needs. In addition, Vector Express ships with a host of advanced features for increased throughput and optimized performance. These include internal gas lift feeders, laser cut-off, off-sight FRC, adjustable etch rates, and much more. LAM RESEARCH / NOVELLUS Vector Express also offers advanced software controls, and is compatible with most software packages. It has built-in data logging capabilities, allowing customers to track every set point and process step in the etching cycle. This data can be used to further optimize and refine processes to meet specific requirements. Finally, NOVELLUS Vector Express is also low-cost to own and operate. It boasts a robust design, which helps ensure that it will provide reliable results for years to come. It's highly modular architecture allows users to add multiple modules and customizations, so that it fits their requirements. In sum, LAM RESEARCH Vector Express is an advanced etcher/asher designed to provide superior etching, deposition and annealing process capabilities. It is configurable to fit a variety of material stacks and its advanced features enable customers to reliably achieve repeatable results from their most challenging materials. Its low-cost ownership and compatibility with a host of software packages make this etching system an ideal choice for those looking to speed cycle times and increase process efficiency.