Used LAM RESEARCH / NOVELLUS Vector Express #9372786 for sale

LAM RESEARCH / NOVELLUS Vector Express from NOVELLUS is an advanced etcher/asher platform designed for precision applications requiring precise micro-structuring and manipulation of substrates. It features a standard vacuum chamber that is insulated to reduce particulate infiltration, an integrated gas and chemical delivery equipment, as well as advanced scanning and Focus Ion Beam (FIB) capabilities. NOVELLUS Vector Express also features a unique substrate-stepped surface software that automatically creates a series of shallow channels for etching narrow pathways with no exposure to UV light. LAM RESEARCH Vector Express also includes a variety of advanced tooling and monitoring features such as laser/beam position feedback systems, advanced positioning mechanisms, an automated Substrate Wafer Alignment System (SWAS), and a controlled environment air cooling unit. Its integrated gas delivery machine allows users to easily adjust parameters such as chemical composition, pressure, and temperature for optimal etching conditions. Vector Express provides an unparalleled level of accuracy and precision due to its ion beam optics, which enable the etching of intricate patterns. Additionally, its advanced process control tool automatically calibrates and maintains optimal etching parameters. LAM RESEARCH / NOVELLUS Vector Express also features an intuitive user interface which enables users to easily access a variety of tools and functions, such as substrate selection, automatic and manual alignment, and parameter choice. NOVELLUS Vector Express's performance is further enhanced by its multi-plane gas flow asset, its fast dielectric guard-ring de-layering process, and enhanced wet etch technology. The model also includes a programmable array of nozzle heads that allow users to access multiple etching techniques all at once. Finally, LAM RESEARCH Vector Express also includes a number of capabilities for post-etching data analysis and monitoring, allowing for enhanced process control and reduced time-to-inspection.