Used LAM RESEARCH / NOVELLUS Vector Extreme #293754606 for sale
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LAM RESEARCH / NOVELLUS Vector Extreme is an etcher or asher that is used in the fabrication of integrated circuits (ICs). It is capable of creating intricate designs with high precision in the shortest amount of time possible. NOVELLUS Vector Extreme is an important tool for creating high speed and high accuracy ICs for modern electronics devices. LAM RESEARCH VECTOR EXTREME works by using a cutting-edge, intense plasma etching process in order to etch extremely tiny IC patterns with extremely high levels of accuracy. It employs a multi-arc plasma source to create uniform, very high-density plasma that is used to etch the patterns. This plasma source is driven by a radio frequency generator, which also helps to maintain a highly uniform plasma distribution. NOVELLUS VECTOR EXTREME is also equipped with advanced software that allows it to rapidly switch between recipes (etching modes). This allows the machine to be used in a wide range of etching applications, including shallow trenches, micro vias, and deep-trench technology. Additionally, LAM RESEARCH / NOVELLUS VECTOR EXTREME is capable of etching up to four wafers simultaneously, and it is able to etch features of up to 8.5 microns (1/8 mil). LAM RESEARCH Vector Extreme is equipped with a novel gas delivery system that is tailored to the specific materials that are being etched. This gas is carefully distributed through the plasma in order to allow for more precise etching. Additionally, the etching process can be adjusted in order to enable etching of both sides of the wafer. The machine's pressure control system also ensures that the process is kept consistent and under control. Overall, Vector Extreme is a powerful and versatile etching solution that is designed to create intricate patterns with the utmost precision and speed. It is an invaluable tool for the fabrication of high-tech integrated circuits, and its advanced software and gas delivery systems make it an ideal choice for all kinds of etching applications.
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