Used LAM RESEARCH / NOVELLUS Vector Extreme #293767058 for sale

ID: 293767058
Vintage: 2012
System Chamber position / Gases Unit 1 / SiH4, N2, C2H2, H2, HE, O2, NF3, AR Unit 2 / SiH4, N2, C2H2, H2, HE, O2, NF3, AR 2012 vintage.
LAM RESEARCH / NOVELLUS Vector Extreme is a world-class etcher and asher for the semiconductor manufacturing industry. It is specifically designed to provide advanced precision and low defects for critical etch and ash operations. NOVELLUS Vector Extreme utilizes a revolutionary high-density dual source plasma processing technology to achieve improved control, lower particle generation, and higher throughput for back end of line etch applications. It also supports a broad range of etch chemistries to enable versatile process optimization and cost-efficient processing of advanced node devices. LAM RESEARCH VECTOR EXTREME etcher / asher offers maximum flexibility and scalability for various device structures and applications, while supporting a wide range of package formats, sizes, and sizes. It features a highly configurable 750mm platform and is capable of handling die sizes up to 3750mm2. Other key features include Dynamic-Etch Technology, an advanced physical modeling capability to optimize the etch process for DVD applications; Micron-Accuracy Leveling (MAL), a unique peak-and-valley trace height compensation technology for precise etch process control; and Expandable Wafer Changer (EWC), a modular work-handling system in a cohesive open architecture that maximizes process flexibility. Vector Extreme's lift-off etch capability is designed to minimize the need to move the wafer across the chuck during processing, while also reducing pressure variation across the wafer. Additionally, LAM RESEARCH / NOVELLUS VECTOR EXTREME includes advanced clean capabilities such as Advanced High Temperature Hydride CVD (AHT-CVD) to ensure maximum process stability and minimal particle generation. With robust process control features such as Active Process Monitoring (APM), Process Adapter Autotuning, and Extended Recipe Based Interfacing (ERBI), it ensures precise tuning with multiple targets for easy etch process optimization. NOVELLUS VECTOR EXTREME provides reliability and robustness, with a wide range of features to meet today's most demanding semiconductor device requirements. With its advanced technology, high-throughput, and configurability, LAM RESEARCH Vector Extreme is the perfect choice for all your etching and ashing needs in the semiconductor industry.
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