Used LAM RESEARCH / NOVELLUS Vector Extreme #293767216 for sale
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ID: 293767216
Vintage: 2014
System
Chamber position / Gases
Unit 1 / SiH4, N2, C2H2, H2, HE, O2, NF3, AR
Unit 2 / SiH4, N2, C2H2, H2, HE, O2, NF3, AR
Unit 3 / SiH4, N2, C2H2, H2, HE, O2, NF3, AR
2014 vintage.
LAM RESEARCH / NOVELLUS Vector Extreme is an etcher/asher specifically designed for advanced electrochemical and physical vapor deposition applications. A perfect combination of performance and quality, NOVELLUS Vector Extreme offers high throughput and an intuitive user interface, allowing users to easily set up and adjust recipe parameters. Its precision motion equipment and digital system provide superior precision and repeatability of the etching process, enabling high-density imaging on the most complex wafer substrates. LAM RESEARCH VECTOR EXTREME offers superior imaging speed, delivering low defectivity, superior morphology, and fast turnaround times. The unit has a maximum throughput rate of 4,200 wafers per hour and delivers precise process control, enabling users to implement process recipes with accuracy and repeatability. It features a process chamber capable of accommodating multiple process configurations, including multi-source etching, dual-target ion milling, and chemical vapor deposition (CVD). To meet the challenges of high-end etch applications, NOVELLUS VECTOR EXTREME has been engineered with high-speed multiple source injectors and alternating dual magnetron plasma sources. Featuring patented core technology, VECTOR EXTREME machine offers best in class etcher/asher performance. The tool's advanced, interactive, real-time control technology provides fast reaction times and the ability to adjust critical parameters such as frequency and duty cycle on-the-fly. Its open-loop motion asset allows for positioning of kinematic components to within ±0.25 µm, and its integrated vision model ensures a high degree of accuracy when positioning targets in the chamber. The VCA (vision based control and analysis software) allows users to manage process parameters with ease, and the equipment's advanced automation software enables users to build and implement complex recipes quickly and efficiently. LAM RESEARCH Vector Extreme system also features advanced monitoring and diagnosing capabilities, ensuring uptime and process quality. With built-in process monitoring capabilities, the unit can provide immediate feedback on chamber performance, while the intuitive user interface delivers easy-to-use setup and recipe management. Additionally, LAM RESEARCH / NOVELLUS VECTOR EXTREME machine is compliant with all semiconductor safety regulations, providing a safe working environment for operators. In conclusion, Vector Extreme etcher/asher offers superior performance and quality in a highly reliable and easy-to-use package. Its advanced real-time control technology, fast reaction times, and precise motion tool enable users to fabricate complex structures with speed and accuracy, making it an ideal solution for advanced etch applications.
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