Used LAM RESEARCH / NOVELLUS Vector Extreme #9099744 for sale

LAM RESEARCH / NOVELLUS Vector Extreme is an advanced etcher/asher that uses plasma-based reactive ion etching (RIE) technology to process wafers with highly precise etching and body biasing applications. The equipment provides linear etch control with high precision and uniformity, and is capable of handling a variety of wafer sizes, temperatures and environments. NOVELLUS Vector Extreme is designed for use in cleanroom environments and consists of two separate subsystems that work independently of one another to ensure the highest levels of etching precision and accuracy. The first subsystem is the Plasma Source System, which generates the reactive ion etch (RIE) plasma to etch the wafers with near-perfect accuracy. The second subsystem is the Gas Delivery Unit, which provides precisely metered mixtures of etch and cleaning gases for optimal etch processing. LAM RESEARCH VECTOR EXTREME also incorporates a high degree of automation, allowing the user to customize the parameters of the etching profile to meet specific requirements. In addition, the machine is engineered to minimize particle contamination for maximum reliability and process control. NOVELLUS VECTOR EXTREME is capable of achieving process repeatability better than 1% and a minimum linewidth of as small as 30 nm, ideal for scaled lithography applications. With its robust design and outstanding capabilities, VECTOR EXTREME is an excellent choice for a variety of etching and body biasing tasks in a variety of cleanroom environments.