Used LAM RESEARCH / NOVELLUS Vector Extreme #9270881 for sale

LAM RESEARCH / NOVELLUS Vector Extreme is an etcher and asher designed specifically for modern semiconductor processing. It is the leading multi-station plasma etch tool for advanced semiconductors. The design of NOVELLUS Vector Extreme is optimized for precision and high throughput. It features a flexible and configurable architecture that can be used for both vertical and horizontal etch and ash applications. This flexibility allows for customizing the equipment to meet the target specs for a specific application. Its high-resolution optical system delivers precise control of the plasma, enabling precise etching and ash processes. LAM RESEARCH VECTOR EXTREME is equipped with a high-performance RF induction generator that offers stable and repeatable plasma processing. Its advanced vectoring feature enables quick and accurate alignment of the RF generator to the wafer stage, resulting in improved processing yields. The vectoring unit also ensures consistent placement of particles and other contaminants in the plasma, helping to prevent non-uniform etching and ash results. VECTOR EXTREME is also equipped with a gas mixing console that allows for precise tuning of the operating parameters for any particular etching and ash recipe. This machine helps to ensure repeatable and reliable results. Additionally, the gas mixing station can be used to monitor the purity of the gases being used in the plasma generator and diagnose problems that may arise during processing. LAM RESEARCH / NOVELLUS VECTOR EXTREME also offers fast and easy maintenance with its automated self-cleaning tool. This asset is designed to reduce downtime and enhance model reliability and performance. Finally, LAM RESEARCH Vector Extreme is compatible with a variety of advanced sensors and controllers, allowing users to customize the equipment to suit their specific process requirements. In conclusion, NOVELLUS VECTOR EXTREME is an advanced etcher and asher designed to enable high-precision and high throughput semiconductor fabrication processes. Its advanced features, such as vectoring, fast maintenance, and gas mixing ensure repeatable and reliable results. Its high-resolution optical system allows precise control of the plasma for precise etching and ash processes. Finally, its compatibility with a variety of controllers and sensors aids users in customizing the unit to accommodate their process requirements.