Used LAM RESEARCH / NOVELLUS Vector #9227340 for sale
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ID: 9227340
Wafer Size: 12"
Vintage: 2003
CVD System, 12"
PE-TEOS Process
Automatic lift chamber mechanism
I/O Port stage: OHT
Foup capability: (25) Slots
Controller:
System monitor: LCD Type
Remote monitor: Keyboard, LCD type
Controllers & boards temperature: Under 40°C
Gas system:
Gas line: 1/4 VCR
NF3 Gas
Filter: SUS316 SS / NF3 Hastelloy
Gas box temperature: Display by digital gauge
Negative voltage of MFC signal: Display, interlock
SAMSUNG Chamber pump
Load lock & turbo molecular pump
Capacitance manometer for chamber pressure control: Tempered type
Pressure transducer for chamber: ATM Switch
TM & Load lock fore line shut-off valve: Electric valve
Ground for D NET: Chassis ground
Circuit safe guard: All Circuit breaker
Internal utility line color SEMI Standard
Heat exchanger: Pressure control
Chamber
AC Rack
NPP Rack
NTU Box
Wall computer
Chase computer
2003 vintage.
LAM RESEARCH / NOVELLUS Vector is an advanced etcher / asher tool used in semiconductor manufacturing processes. It is an environmental process chamber that enables high-precision plasma etching of substrates such as quartz, silicon, and certain metals. NOVELLUS Vector features two plasma sources: one standard source, which is a 13.56 MHz RF generator, and an optional, switchable source, which is a low-frequency RF power source. These two plasma sources allow for etching a wide range of materials with different etch chemistries. It also features a high-power rapid thermal annealing (RTA) chamber, which allows for faster thermal treatment of substrates. LAM RESEARCH Vector has several features that make it a versatile etching tool. Its vertical design provides a uniform etching environment, while its self-adjusting stage is used to align and adjust for different substrate morphology. It is also equipped with automated valves to maximize different processing chemistries, as well as precision motion controllers to align the wafer to the target etch depth. Additionally, Vector is equipped with a sophisticated scan algorithm to control process time and depth accurately. Its automated wafer loading and unloading also make it easy to operate. LAM RESEARCH / NOVELLUS Vector's advanced etching capabilities make it an ideal tool for a variety of projects. It offers an optimal etch quality with its combination of accuracy and control. Its self-regulating plasma source also allows operators to adjust etching density and recipes easily, providing efficient and effective processing results. Moreover, its fast thermal processing capabilities enable a compact processing cycle and make sure that substrates are quickly ready for the next process. Overall, NOVELLUS Vector etcher/asher is a user-friendly, highly advanced etch system. It is an excellent choice for semiconductor manufacturing projects due to its high-precision plasma etching capabilities combined with rapid thermal annealing and automated wafer handling. Its versatile features make LAM RESEARCH Vector an incredibly reliable and effective etching tool.
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