Used LAM RESEARCH / NOVELLUS Vector #9378180 for sale
URL successfully copied!
LAM RESEARCH / NOVELLUS Vector is an advanced etcher/asher equipment designed for high-volume wafer manufacturing. It is used in fabrication plants for high-tech chip production; NOVELLUS Vector works alongside other etching tools to define, shape, and clean different layers of a wafer or chip. LAM RESEARCH Vector utilizes fluorine-based plasmas to etch and clean thin layers of silicon, copper, and other materials. It is capable of performing various, more precise and detailed etching operations compared to its counterparts. It uses advanced technologies, such as Helium-Enhanced Plasma Asher (HEPA), and High Density Inductive Coupling (HDIC), enabling fast, precise control of temperature, flowrate, and etch rate profiles. Vector's unique RF inductive source design also allows for precise control of particle density and energy distribution, which can improve etch yields and minimize undesired damage to the substrate. In addition, the system is specifically designed with safety and efficiency in mind. It incorporates advanced automation technology and quality assurance operations, which drastically reduce the time required for etching operations. LAM RESEARCH / NOVELLUS Vector's advanced software suite ensures process consistency and eliminates potential for human errors. This improves upon-tool metrology, allowing process engineers to quickly detect potential issues before they become critical performance failures. This is further assisted by the unit's high throughput, making it ideal for high-volume production. NOVELLUS Vector also boasts a sophisticated contamination-control machine built-in, which controls every aspect of both new and used materials. This ensures the cleanliness of the etch chamber, and prevents potential deposits from being transferred to wafers, which could lead to process failure. Overall, LAM RESEARCH Vector is a reliable, high-performing etcher/asher tool from NOVELLUS. It is based on advanced technologies and offers greater control over the etching process. Its safety and contamination-control features make it a powerful tool for high-volume production workflows.
There are no reviews yet