Used LAM RESEARCH Rainbow 4520i #293595654 for sale

LAM RESEARCH Rainbow 4520i is a reliable and advanced etcher/asher platform. It is equipped with a single-wafer processing capability and multiple etching/stripping source configurations, making it an ideal solution for a wide range of complex applications. It is capable of producing nanometer-scale etches and ashers, ideal for the development and production of semiconductor products. The 4520i utilizes a low-pressure, inductively coupled plasma source with a cylindrical quartz showerhead, as well as a high frequency plasma source. This dual-source configuration provides for both uniformity and specific etching selectivity over a wide process range. The system also includes a quartz chamber, which allows for low usage of process gases, enabling the system to operate with a reduced carbon footprint. Rainbow 4520i features an ultra-compact footprint and an easy-to-operate user interface, allowing it to be efficiently integrated into any production environment. Additionally, the system offers an exceptional Level-1 Class 100 clean room environment, allowing for more efficient processes while minimizing contamination and interfering signals. The 4520i also features a potent combination of process control and monitoring capabilities, providing value-added flexibility and capabilities. This includes the inclusion of a cam-filled wafer stage, integrated RF control systems, complex chamber control, wafer mapping and process history for addressing spatial and temporal non-uniformities. This precision capability delivers a perfect balance of etch process performance and automation. The 4520i also includes a series of advanced fault monitoring and diagnostic capabilities including electrode chain diagnostics and electhrowizing monitoring. These features provide an expansive toolset for process control, optimization and diagnostics. LAM RESEARCH Rainbow 4520i is an optimal solution for any etch or asher application. It features a robust set of features, process control capabilities and diagnostic features, allowing it to be efficiently and precisely used for complex applications. Its low-pressure, inductively coupled plasma configuration and its advanced feature set make it an ideal choice for efficient, precise and cost-effective etch/asher processing.