Used LAM RESEARCH Rainbow 4520i #9198092 for sale

ID: 9198092
Etcher With isotropic etch module Currently de-installed.
LAM RESEARCH Rainbow 4520i is an advanced etcher / asher equipment designed to provide maximum versatility and state-of-the-art precision in substrate processing. As a result, this system is ideal for scientific and industrial research as well as production processing. Rainbow 4520i employs a dual cup unit, a vertical magnetron source, and state-of-the-art process monitoring and control to enable precise etch and ash processes. In this machine, the etch and ash tasks are carried out in independently adjustable, repeatable, and automated chambers. This advanced technology allows for the processing of a variety of substrates such as insulator and conductor materials, even high aspect ratio features. Furthermore, the process window of the etcher / asher can be customized according to customer requirements. The substrate is introduced into the pre-cleaning chamber where material removal, model based profiles and edge-bead removal are applied, followed by a post-cleaning process. The end-point detection (EPD) technique improves upon the conventional endpoint detection methods by providing a real-time feedback on the etch and ash process. Apart from its advanced etch and ash capabilities, LAM RESEARCH Rainbow 4520i is highly reliable, robust and easy to operate. The temperature and pressure are controlled through the touch-screen interface, allowing for the monitoring of pressure, flow, temperature and gas mixed ratios during the process. The self-explanatory menus simplify the process operation and make it more intuitive. This tool incorporates a high-speed personal computer (PC) which outperforms slow microprocessor control systems. The multi-language user interface is available in various languages, making it easier for end-users from around the globe to take advantage of its features. The contamination control asset provides improved process consistency and yields. In conclusion, Rainbow 4520i is an advanced etcher / asher model that offers a complete solution for scientific and industrial research, as well as production processing. Its user-friendly interface, process control and robust construction provide reliable, repeatable and repeatable results on a variety of substrates.
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