Used LAM RESEARCH Rainbow 4520i #9205536 for sale

LAM RESEARCH Rainbow 4520i is an advanced etch/ash process tool ideal for a wide range of wafer etching/ashing applications. Rainbow 4520i equipment was specifically designed to optimize process parameters and performance. The advanced design of the 4520i reduces complexity and eliminates costly upgrades, while providing superior process control and plasma generation. LAM RESEARCH Rainbow 4520i's advanced etch/ash technology provides the user with an automated, high-velocity, plasma-based process for etching and ashing a wide variety of materials for semiconductor applications. Rainbow 4520i is equipped with a number of features which provide the utmost in wafer process control and efficiency. Its Universal Process Module (UPM) allows for the quick interchange of multiple process modules without the need to remove the wafer from the system. This allows for multiple etch/ash processing all in one unit. LAM RESEARCH Rainbow 4520i also features powerful diagnostic tools and analysis software, making process monitoring and optimization easier than ever. The 4520i has a large capacity substrate carrier that is ideal for processing a variety of substrates at the same time. The substrate carrier can hold up to two hundred 200mm wafers (optional 300mm wafer) and four corresponding trays which can move the wafers relative to the process chamber. The substrate carrier also includes individual wafer heaters, enabling independent per wafer heating, which can help improve process uniformity. Rainbow 4520i is an advanced, high-throughput machine, enabling fast etching and ashing of material intended for microelectronics applications. The tool uses advanced plasma processes to generate a plasma stream which is optimized for etching and ashing of materials for a variety of different applications. The asset is designed with a pathway for processes without a carrier and uses nozzle arrays to ensure uniform etching and ashing processes. LAM RESEARCH Rainbow 4520i is also available with the PowerPAC software suite which is designed to improve process yield, manage time and improve process consistency. The PowerPAC software suite compiles all control, optimization, archival and fundamental modeling features into one easy-to-use package. With PowerPAC, operators can easily monitor, optimize and streamline multiple etch/ash processes. In conclusion, Rainbow 4520i is an advanced etch/ash process tool, ideal for a wide range of wafer etching and ashing applications. The advanced design of the model reduces complexity and eliminates costly upgrades while providing superior process control and plasma generation. The equipment is equipped with a number of features which provide users with an automated, high-throughput, plasma-based process, allowing for multiple etch/ash processes in one system.