Used OXFORD Plasmalab 100+ ICP 380 #293610678 for sale

OXFORD Plasmalab 100+ ICP 380 etcher / asher is an advanced tool designed to enable efficient material preparation and large-scale, complex fabrication processes. This versatile system offers a wide range of etching and annealing options for nanofabrication and microfabrication. It is made up of four basic components: the system control software, the ICP source, the substrate holder, and the chamber. The system control software provides users with an intuitive user interface that is easy to learn and use. All of the tasks involved in running OXFORD PLASMALAB 100 ICP 380 can be managed from the graphical user interface, such as setting the desired pressure, selecting the etch parameters, or setting up the desired programming run. This interface also offers a range of advanced etching and annealing options to maximize precision material preparation. The ICP source utilizes argon, oxygen or other gases to power a high-density plasma arc in order to efficiently etch and prepare surfaces of a variety of materials. This ICP source is highly reliable and requires minimal maintenance; it has an impressive life expectancy that ensures its users of quality finishes and exact results every time. The substrate holder is designed to safely and accurately hold the surface material-whether it be printed circuit board, silicon or glass-that is being worked on. This holder is adjustable and can be moved in practically any direction required to enable a multitude of manufacturing techniques. The chamber for PLASMALAB 100-ICP 380 is formed out of modulated steel, which is highly resistant to corrosion and maintains a controlled environment for critical etch and annealing processes. It features a perfectly uniform gas flow, vacuum drainage, automatic cooling and venting of gases, and in-chamber temperature control. All of these features work together to ensure the highest level of accuracy and precision, as well as a safe working environment. Overall, OXFORD PLASMALAB 100-ICP 380 etcher / asher provides a wide range of capabilities for efficient material preparation and advanced, complex fabrication processes. It utilizes a highly reliable ICP source, controllable substrate holder, and a corrosion-resistant chamber to ensure precision and exact results every time. Its advanced etching and annealing options further extend its capabilities and make it the perfect tool for intricate fabrication and material preparation applications.