Used OXFORD Plasmalab 100+ ICP 380 #293817369 for sale

OXFORD Plasmalab 100 etcher / asher is an advanced plasma etching system suitable for various research and industrial applications. It enables users to etch and asher different substrates, such as metals, polymers, and ceramic materials, with high precision. Plasmalab 100 features a low-temperature, low-power microwave plasma source, making it suitable for a wide range of materials and applications. OXFORD Plasmalab 100 also features adjustable input radio frequency (RF) power, allowing users to control the power delivered to the sample. It also offers comprehensive control of both the plasma source parameters and the etching conditions to enable users to optimize the process to their specific materials and requirements. This advanced etching system utilizes high-purity oxygen, nitrogen, and argon gas sources to ensure consistent etching performance. Plasmalab 100 is equipped with an advanced high-precision, semiautomatic handling unit, which enables the convenient and safe processing of up to three substrates simultaneously. This allows users to process larger areas in a shorter amount of time with high precision. OXFORD Plasmalab 100 also ensures compatibility with a wide range of process gases (e.g., carbon dioxide, oxygen, chlorine, etc.), making this etcher highly versatile. Plasmalab 100 offers a user-friendly, advanced graphical user interface (GUI) which allows users to monitor and control all process parameters. It also provides data logging capabilities via USB for post-processing and recording of vital process parameters. An onboard diagnostic system is also present which enables users to track the various performance parameters of the machine during etching and ashing operations. With its comprehensive range of features and control options, OXFORD Plasmalab 100 makes an ideal choice for a wide range of etching applications.