Used OXFORD Plasmalab 133 #293651582 for sale

OXFORD Plasmalab 133 is a sophisticated piece of etching and ashing equipment used to produce surface samples with high precision. Its unique design allows for precision ashing and etching of a wide range of materials, ranging from metals and alloys to even organic substrates. Plasmalab 133 is ideal for processes requiring high selectivity in etching and ashing, where high precision and accurate process control are of the utmost importance. It is an automated plasma etcher and asher that can be programmed to process material samples of almost any thickness. The equipment features a pulsed RF (RF, Radio Frequency) plasma source, with the possibility to integrate oxygen, nitrogen and other gases. Its power supplies allow adjustment of the RF frequency, for targeted etching and ashing of material surfaces, to meet specific requirements. OXFORD Plasmalab 133 also features an integrated system to collect and monitor gases generated from the etching and ashing processes. This allows for precise control and monitoring of the process, which is important for quality assurance and data analysis. Plasmalab 133 is designed for safety of the user and the environment. With a class 1 safety membrane, any exposure to hazardous gases or particles is minimized. Additionally, OXFORD Plasmalab 133 can be operated in a stand-alone or inline configuration. In the case of an inline configuration, the unit can be connected to other devices and systems, allowing for more complex processes to be performed. The optics of Plasmalab 133 presents a unique set of features, which allow for precise control over etching and ashing processes. With its adjustable of focus, illumination and reticle, it can provide superior tolerance control, which is key in processes such as semiconductor fabrication. Its advanced optics systems also allow for measurements of the etch depth, enabling precision control over the process. Overall, OXFORD Plasmalab 133 is an excellent etching and ashing machine, designed for precision and accurate process control. Its high-power RF source, customizable optics systems, and user-friendly software make it ideal for various materials and processes, from metals and alloys to even organic substrates. The tool also prevents hazardous exposure, with a class 1 safety membrane, making it an ideal choice for those seeking an automated and reliable etching and ashing solution.