Used OXFORD Plasmalab 133 for sale
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Popular Product
OXFORD
Plasmalab 133
Reactive Ion Etcher (RIE). 2"-12" Power: 600 W, 13.56 MHz RF Wafer thickness: 0.4 – 1.5 mm Etch rat
296
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Popular Product
OXFORD
Plasmalab 133
Reactive Ion Etcher (RIE) Gas holder Control system Chiller Wafer sizes: 2″/3″/4″/5″/6″/8″/12″ Plasm
79
Popular Product
OXFORD
Plasmalab 133
Reactive Ion Etcher (RIE) ADVANCED ENERGY HiLight 136 RF Generator Chamber: Etching chamber Loadloc
626
Popular Product
OXFORD
Plasmalab 133
RIE (FL) Dry etchers FL: Configured for fluorine based chemistry Set up for SiO2 etch Platen: 330 mm
417
