Used OXFORD Plasmalab 133 #293824959 for sale

OXFORD Plasmalab 133 is an advanced etching / ashing equipment for the precise control and manipulation of materials on the nanoscale level. This system is used to create highly precise components with exacting specifications, especially for microelectronics and nanotechnology applications. Plasmalab 133 is equipped with an ECR (electron cyclotron resonance) source which is used to create a plasma environment for the etching and ashing processes. The unit contains an RF (radio-frequency) generator, a source plasma chamber, and a nozzle assembly to focus the plasma. The ECR source has a frequency range of up to 500 MHz, and can produce a maximum power of 4 kW over a wide range of operating frequencies. This source also has an adjustable ionization energy, enabling a wide range of etching and ashing processes. OXFORD Plasmalab 133's source chamber is constructed from stainless steel and allows for up to 8 sample holders to be used during the etching and ashing processes. It also contains a vacuum automated pressure-control machine that allows the user to precisely regulate the pressure of the plasma environment. The chamber also has provisions to enable quick installation or removal of process gases, and to enable background pressure to be maintained. Plasmalab 133 has a number of advanced features that enable precise manipulation of materials on the nanoscale level, including high-resolution scanning and positioning of material, and a high-range of etching and ashing parameters. Additionally, the tool also has safety features including temperature monitoring, emergency stop, and a gas supply shutoff valve. OXFORD Plasmalab 133 is a highly advanced etching / ashing asset suitable for the production of precise components. Its powerful and versatile design make it ideal for a range of nanoscale manipulations, and its safety features ensure the process is undertaken with utmost precision and care.