Used OXFORD Plasmalab 133 #293712618 for sale
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ID: 293712618
Reactive Ion Etcher (RIE)
ADVANCED ENERGY HiLight 136 RF Generator
Chamber:
Etching chamber
Loadlock chamber
Chamber turbo pump:
ALCATEL ATH 400M
ACT 600M Controller
Gas lines:
Cl2 - 100 SCCM
BCl3 - 100 SCCM
CH4 - 50 SCCM
Ar - 100 SCCM
NF3 - 100 SCCM
CHF3 - 200 SCCM
N2O - 200 SCCM
RF Generator power supply: 600 W, 13.56 MHz.
OXFORD Plasmalab 133 is an advanced etching/asher designed for use in high precision plasma etching and dry etching processes. It is a dual-axis, tiltable etching platform that offers a wide range of configurations for handling a variety of application needs. The powerful motorized rotations and tilt mechanism gave Plasmalab 133 a configurable, user-friendly platform. It features an intuitive touchscreen display that allows for the simple control of the etching parameters. The design allows for direct control of the etch points through a CCD viewed, rotation and tilt motions. The platform provides precise alignment of the substrate on glass, silicon, and aluminum substrates. The advanced etching system has an ultra-low environment control system, which provides a safe environment and high throughput capabilities. The chamber pressure of the machine can be controlled as per the plasma etching requirements. OXFORD Plasmalab 133 also features a multi-frequency RF generator that allows users to etch a wide range of materials with corresponding etch rates. It also utilises a dynamic surface matching controller, which actively tracks the etching process and enables finer control over the etching parameters. In addition, the machine is equipped with a high resolution session based analysis software which can be used to analyze and save data for future comparison or analysis. This ensures that the etching process is conducted with precision and repeatability for precise, accurate etching results. Plasmalab 133 is a robust, reliable ashing and etching machine, which is capable of handling the complexity of a large range of high precision etching processes. It provides consistent, uniform results and repeatability, enabling users to obtain high quality results. It is suitable for research labs and high-level industrial applications.
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