Used OXFORD Plasmalab 800 Plus #9404272 for sale
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OXFORD Plasmalab 800 Plus is a state of the art etcher/asher for treatment and etching of a broad range of materials. It provides a high degree of precision and accuracy for processing of delicate materials, and is designed for extreme cleanliness and optimal process control. It is capable of etching, ashing, sputtering and a wide range of other applications with pre-programmed operating sequences and a variety of programmable parameters. The Oxfod Plasmalab 800 Plus is designed to provide high throughput and minimize operator intervention during processes. The process chamber has a vacuum of up to 100 mbar and an interior volume of 23 liters, suitable for samples ranging up to 300mm in size. This enables large-scale deposition of thin films or processing of microelectronic devices with repeatable uniformity and high throughput. The easily accessible front-panel application mode includes recipes for etching and ashing of different materials like metals, semiconductors and ceramics, as well as tailored recipes for more specific processes. The integrated drive system enables precise control of process conditions, with pressure, temperature, flow and base pressure being independently monitored and controlled to optimize process performance and minimize contamination. The advanced user interface allows remote operation and monitoring of process parameters in real time and provides online control of the process steps. All settings and program changes can be accessed remotely via the web server. This ensures that versatile implementation of new processes or routine maintenance of hardware is possible without personnel on site. The rear panel of OXFORD Plasmalab 800 Plus accommodates up to 20 process gases, which can be selected and controlled during etching and ashing operations. Additional features include a powerful data-logging feature that is essentially a built-in programmable data logger, allowing process optimization during experiments and operation. Plasmalab 800 Plus is designed to reduce operational time and improve operational consistency. With its high throughput and large-volume chamber, this etching/ashing system enables users to rapidly develop new processes for micro-scale device fabrication and etching. Its user-friendly interface makes it easy to operate and program, ensuring reliable, consistent and efficient operations.
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