Used STS / CPX Multiplex #293824464 for sale

STS / CPX Multiplex
Manufacturer
STS / CPX
Model
Multiplex
ID: 293824464
Inductively Coupled Plasma (ICP) etcher.
STS / CPX Multiplex is a plasma etching equipment specifically tailored for semiconductor wafer fabrication. This versatile tool can handle a wide variety of applications, from high-density lithography to low voltage oxide etching. STS Multiplex utilizes a revolutionary multi-stage processing system to provide precise control over etch gas composition and temperature, thereby allowing the user to tailor the etching parameters to meet their specific process needs. CPX Multiplex consists of two or four independent, independently-controllable, vacuum-capable processing chambers. This enables the user to pre-treat substrates with CVD or sputter processes before etching and to carry out post-etch treatments such as passivation and deposition. To further optimize processing conditions, Multiplex also offers the ability to connect to central gas and vacuum utilities, enabling the user to automatically control gas concentration and temperatures using a LabView interface. STS / CPX Multiplex offers three different etch methods. The first option is a high-density, high temperature combined gas plasma etch (CGP). This method relies on an effective transport of high concentrations of oxygen, He, and Ar to the substrate to create active valences sites and to ensure a uniform and homogeneous etching pattern. The second etch option is a low-density, low temperature ozone etching (OZ). This method emits ozone molecules in a controlled manner in order to create "etch pockets" for deeper etching. Meanwhile, the third etch option is a low temperature oxygen-ion etching (OI). This etching method is used when ultra-shallow etching is needed, as well as when extremely consistent depth of etch is sought. All three methods are protected by a high temperature, fume-proof quartz bell. Furthermore, STS Multiplex unit is equipped with state-of-the-art safety sensors and real-time monitoring to ensure a safe and reliable etching process. These include Gas Monitoring Sensors, Leak Detectors, Oxygen Sensors, Speed Monitors, and Temperature Monitors. In addition, the machine also includes a built-in wafer handling tool which allows for wafer transfer and loading. Overall, CPX Multiplex is a powerful, versatile etching asset that allows users to tailor the etching process to their specific needs. This makes it an ideal choice for any semiconductor lithography or deep etching application.
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