Used STS / CPX Multiplex #9316685 for sale
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ID: 9316685
Wafer Size: 4"-6"
PECVD System, 4"-6"
Process: SiO2, Si3N4, A-Si
Doping gases: P+/N-
Load lock with (2) wafer carousels
Low and high frequency RF power.
STS / CPX Multiplex is an advanced etcher/asher equipment that is designed to meet the needs of the cutting-edge microelectronics industry. This system uses multiple ion beams and laser light sources to provide precision etching and ashing for numerous processes, including but not limited to three-dimensional etching, deep trench etching, fine line etching, backside-etching, and deep-etching. It is a fully automated unit, and with its state-of-the-art software, users can quickly configure virtually any etch or ashing process with unprecedented accuracy and precision. The machine consists of a main chamber containing the ion source, laser light source, and other necessary components. The ion source is designed to enable the generation of different ion beams for different processes while simultaneously concentrating the beam power at specific areas of the sample. The laser light source is used to create two-dimensional shapes on the sample surface and can be used to both etch and ashen. Additionally, this source can be optimized to deliver laser power precisely where it's needed most, to improve etching and ashing results. The other components in the chamber include a wafer mounting device, ion beam filter, and a cryogenic cooling tool. An intelligent GUI-based software controls the etch and ashing job, configuring the asset parameters accordingly and controlling every stage of the process. The user can easily program the etching/ashing job, including operations such as beam tilt, current, beam speed, dwell time, and so on. STS Multiplex also features both precise in-situ etch monitoring and process irrigation, enabling adjustments to be made as the job progresses to further improve its accuracy. Additionally, the model is equipped with a built-in recipe library, allowing users to recall frequently used processes and make further adjustments as needed. Overall, CPX Multiplex is an advanced, highly capable etch/ash equipment designed to meet the needs of the modern microelectronics industry. Thanks to its multidirectional ion beams, laser light source, and intelligent software, it can provide extremely precise results with a long-running maintenance-free operation.
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