Used TEGAL 901e #293594314 for sale

TEGAL 901e is an etcher designed with producing semiconductor devices in mind. It is capable of operating in both single-side or double-side etching regimes that can be automated or manually controlled. TEGAL 901 E utilizes a resist-coated wafer to be etched by a plasma of fluorocarbon gas molecules. This plasma is generated by the combination of RF energy, Argon, and Oxygen which breaks down the fluorocarbon molecules into small molecules which act as etching agents at the surface of the wafers. This is advantageous as the reaction can be precisely controlled allowing for patterns to be etched with higher detail than is possible with wet etchants. The equipment also includes a vacuum chamber where the gas mixture is contained and a source for both RF and DC power. 901e offers 13 different power levels which allow for optimal tuning of the process. It also features three process timers that allow control over the process times in order to ensure a specific etch depth. 901 E can etch with a uniformity of 2-3% across the wafer and has the capability to etch patterns down to .5 microns. The system can also accommodate wafers up to 200 mm in diameter. The unit itself is relatively economical when compared to similar systems offering similar capabilities and TEGAL 901e is used in many semiconductor laboratories around the world. Maintenance for TEGAL 901 E is minimal and the machine is designed for simple use and operation. It can be used on most types of substrates including silicon, aluminium, and titanium. 901e is versatile and reliable, making it a suitable choice for those seeking a high-quality etcher.