Used TEGAL 901e #68489 for sale

Manufacturer
TEGAL
Model
901e
ID: 68489
Wafer Size: 3" - 6"
etcher, 3"-6" Includes: ENI ACG-10 RF Generator (1000 Watt) DEC monitor station Chart recorder Mass flow controllers with certified calibration sheet Pressure controller with certified calibration sheet Heated baratron with certified calibration sheet Upgraded pressure manifold with Nupro valves Upgraded gas manifold with Nupro valves Top plate chuck interlock Vacuum valve RF interlock Restoration: New Stepper motors New Cylinders NewUpper electrode Chemically clean upper ceramic insulator 5” lower electrode (chuck) Install new 5” Al chuck ring Install new 5”super spatula assy’s Install 5” super tine assy. Install new quartz pins Install new collar pins Install new metering valves Install new flexible gas lines Rebuild chuck cylinder Rebuild pin cylinder Install new flow switches SST Install new standoffs Install new safety covers Install new bellows HPS angle valve Install new seals and O-rings, process chamber assy Install bearings Install new sapphire rod Install new fiber optics Install new sensor PCB Install new tubing Install new capacitive sensors Install new RF cables Install new variable caps TEGAL chiller is available for an additional cost.
TEGAL 901e is a reactive ion etcher/ascher, ideal for use in processes requiring anisotropic (vertical) etch/etch-and-ash processes. TEGAL 901 E can etch a variety of materials, including quartz, silicon oxide, polysilicon, aluminum oxide, gallium arsenide, and silicon nitride. It is designed to be highly precise and reliable, making it a great choice for those looking for consistent results with minimal maintenance. 901e offers a variety of process parameters and recipes. It can etch at low and high temperatures, with etching rates ranging from 1 to 20 Å/min (depending on the application). It is capable of providing both standard and deep etching capabilities, with the maximum substrate temperature reaching up to 500°C. It is also equipped with a wide range of end point options, including time, thickness, and resistance. 901 E is reliable and efficient, utilizing an intelligent frequency control system to ensure precision and repeatability. Its powerful process controls provide improved depth and uniformity, while its adjustable gas supply system allows for higher process speeds. The Pulsed Mode technology employed in TEGAL 901e ensures controlled reactive ion etching conditions, resulting in greater selectivity and higher throughput. TEGAL 901 E is equipped with an intuitive graphical user interface, allowing for easy and quick process set up. It comes with a number of features for enhanced productivity, including faster process set up, improved monitoring and control, and process improvement support. Its advanced power pulser and voltage control systems provide improved etching satisfaction and accuracy, and its advanced safety systems prevent thermal runaway and other accident scenarios. 901e is a highly reliable and efficient plasma etcher and asher, making it an ideal choice for advanced semiconductor processing applications. Its intuitive user interface, combined with its versatile process capabilities, makes it an excellent choice for both commercial and laboratory use. With its reliability, precision and advanced safety protocols, it is an excellent choice for those demanding reliable performance and consistent results.
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