Used TEGAL 901e #70080 for sale
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ID: 70080
Wafer Size: 4" - 6"
plasma etcher, 4"-6" capability
Silicon dioxide Plasma Etcher
Cassette to cassette
13.56 MHz ENI RF Generator, 1000W
Microprocessor control
Non-friction spatula wafer transport.
TEGAL 901e is an advanced etcher developed specifically for use in semiconductor applications. It is a 'stand-alone' equipment, consisting of a rotary outer and inner chamber design that provide uniform processing results. Features include high through-put, wafer handling capability of up to three units, uniform etch results and superior cleanliness. The system has a built-in programmable controller with easy-to-use features and dynamic interactive displays. An intuitive Graphical User Interface (GUI) is available for customizing parameters and monitoring progress of each process. The software also allows remote control via a direct serial communications link, or via the popular remote control protocol (RCP) developed specifically by TEGAL Corporation. TEGAL 901 E uses direct, indirect or combination plasma sources to perform etching or surface treating on semiconductor wafers. The unit uses a Gas Control Unit (GCU) to monitor and control the gases being used in the etching process. The GCU is programmed with a gas concentration profile that is capable of supporting up to 16 process stages. The wafers are placed horizontally in the machine and then transported automatically in clockwise or counterclockwise direction at a programmable velocity. An isolated plasma source is available for each wafer section of the tool, providing for a more controlled ion bombardment of the wafer, resulting in superior etch results. 901e's advanced etch chamber design results in superior process consistency, minimal particle contamination and maximum throughput. The etch chambers are pressure-controlled with a consistent temperature, creating a uniform etching environment. 901 E asset offers a variety of repeatable processes and recipes that can be stored for future use. The control for TEGAL 901e is based on a three-axis motion control model with integral PID loop control, providing an optimal etching environment. The equipment also has an oscillating etch option that can be used to improve uniformity on parts with circular geometries. TEGAL 901 E is the ideal system for etching and surface treating semiconductor wafers. Its user-friendly GUI, advanced etching technology and flexibility are ideal for the production of highly reliable semiconductor devices.
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