Used TEGAL 901e #70082 for sale
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ID: 70082
Wafer Size: 4" - 6"
Plasma etcher, 4"-6" capability
Photoresisty stripper
Cassette to cassette
13.56 MHz ENI RF Generator, 1000W
Microprocessor control
Non-friction spatula wafer transport.
TEGAL 901e is an advanced etcher/asher designed to be used in a wide range of industries such as microelectronics, medical instrument manufacturing, life sciences, and nanotechnology. It offers a wide range of features for high throughput and precise etching, allowing for the fabrication of micro and nano devices and circuits. TEGAL 901 E is based on advanced electron beam lithography technology, which offers precision and high throughput. It can achieve ultra-fine etching to create intricate patterns and features on a wide range of substrates and materials. The equipment comes with a motorized stage and an optical microscope for precise alignment of the substrates and a vacuum chucking system for substrate positioning and etch depth. With this, the device can etch even minute patterns down to the nanometer level. 901e utilizes a gallium arsenide electron gun that can generate a wide range of beam currents ranging from 100pA/V to 10,000pA/V at accelerating voltages ranging from 0-30KV. This allows for the creation of fine line widths and other intricate features that are required for the fabrication of modern micro and nano devices. The unit also features integrated software for adjusting beam brightness and focus as well as for alignment and patterning. It is also fully compatible with most standard process chambers and can be used in a wide variety of applications. The machine comes with a 12" wafer - carrier plate and is capable of handling wafers up to 8" in diameter. 901 E also includes a range of safety protection mechanisms to ensure the safety of personnel and the tool, such as an interlock asset, halogen lamp warning model, E-Stop switch, multiplexing switch, and water cooling circuits with safety functions. Overall, TEGAL 901e is a powerful, versatile etcher/asher, perfectly suited for modern micro and nano device fabrication applications. It is handled easily, with an intuitive software interface, range of safety features, and precision and throughput capabilities for complex device fabrication.
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