Used TEGAL 901e #70083 for sale

TEGAL 901e is a top-of-the-line plasma etch and asher equipment designed for modern microfabrication processes. This semi-automated system features a novel design that is well-suited for a wide range of application areas, making it an ideal choice for researchers, engineers and industrial process developers. TEGAL 901 E boasts a number of advantages over manual etching and ashing techniques, such as fast plasma etching rates, excellent process control, and precision ratiometric linear etch depth control. 901e's large 10" x 8" working area allows for high throughput and rapid processing of large substrate sizes. Its powerful RF generator unit enables the user to precisely control the delivered power. The wide range of etch recipes can be adjusted by changing the process parameters, such as gas flow, pressure, chamber temperature, and other variables, allowing for fine tune parameter settings and repeatable, high-precision results. The unique chamber design is tailored to maximise process efficiency and minimize contamination, resulting in extremely low particle counts and optimal uniformity. 901 E also provides access to advanced etching and ashing capabilities, such as directional and anisotropic etching/ashing, high aspect ratio structures, as well as improved selectivity for different materials. The machine is designed for accurate control over etch depth and width, enabling researchers to conduct etch experiments, process characterization and development. TEGAL 901e features touch-screen operations, allowing for intuitive user control, allowing for simple recipe creation, etch rate monitoring and process analysis. For more complex applications, TEGAL 901 E comes equipped with a comprehensive set of onboard data systems, providing users with detailed process feedback. The ergonomic design of the tool allows for easy cleaning, routine maintenance and extended up-time in production. In conclusion, 901e is an excellent choice for those who are looking for a reliable and highly capable plasma etch and asher asset. It is constructed with the highest level of precision and attention to detail to ensure consistent, reliable performance. 901 E offers excellent throughput, accuracy and control, making it an ideal choice for microfabrication processes.