Used TEGAL 901e #75520 for sale
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ID: 75520
Wafer Size: 4"
Plasma Etcher, rebuilt Cassette to Cassette, Polysilicon / Silicon Nitride
Currently configured for 4" wafers
ENI 1000 Watt 13.56 MHz RF Generator
20 Process recipe capability
Non-friction spatula pick and place wafer transport
Leybold D65 oxygen service pump
Tegal Closed loop temperature controller
Chart recorder for endpoint trace monitoring
DEC Monitor and keyboard
Manuals included
Facility requirements
200-240 VAC selectable (50/60hz) single phase
RF Generator 200-240 VAC selectable (plugs into 901e)
Monitor 115VAC (plugs into 901e)
Chart Recorder 115VAC (plugs into 901e)
Vacuum pump 200-230 VAC 3-phase
Temperature controller 115 VAC
CDA or N2 regulated to 80 +/- 5 psi
N2 regulated 15 to 30 psi
Process gas’s regulated to 15+/- 5psig (Regulators currently installed on table)
O2 clean regulated to 10+/- 5psi
901e Vacuum pump connection KF-40 Flange
901e Cabinet exhaust connection 4” 100 cfm.
TEGAL 901e is a benchtop Plasma Asher / Etcher that has become an important tool in the semiconductor manufacturing industry. Developed by TEGAL Corporation, TEGAL 901 E is a highly efficient and reliable equipment that can be used for a variety of etching and ashing processes. 901e is composed of a base unit, power supply, controller, adjustable sample holder and a chamber. The base unit of 901 E is made of rigid aluminum alloy and includes a top platen and two side access doors. The power supply of the system uses a voltage of up to 1,000V and a maximum current of 1,000 mA. The power supply can be configured to provide different power profiles giving TEGAL 901e the flexibility to perform a range of ashing and etching processes. The controller of TEGAL 901 E allows for easy user interface and control over the unit, featuring an intuitive graphical user interface and diagnostic instruments. The sample holder is adjustable allowing for the introduction of a variety of sample materials. The chamber allows for an inert atmosphere, enabling maximum control over the process environment. 901e can be used to etch or as both material surfaces including thin films, metals, polymers, semiconductors and dielectrics. The machine offers rapid process times, enabling etching or ashing of samples in seconds to a few minutes and displaying no damage to materials upon completion. In conclusion, 901 E is a multi-functional asher and etcher that is highly efficient and reliable. With the ability to precisely control the process environment and rapid process times, TEGAL 901e is an important tool for the semiconductor manufacturing industry.
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